SCHEMBL29323870

SCHEMBL29323870

C=C(C)C(=O)Oc1ccc(C(CS(=O)(=O)Cc2ccccc2)CS(=O)(=O)Cc2ccccc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.49
HPGD P15428 1/20 0.42
KMT2A Q03164 4/20 0.38
ATM Q13315 1/20 0.38
ALDH1A1 P00352 1/20 0.37
FPR1 P21462 1/20 0.37
HSD17B10 Q99714 1/20 0.37
PRKCA P17252 2/20 0.37
PRKCD Q05655 2/20 0.37
L3MBTL1 Q9Y468 1/20 0.36
MMP2 P08253 1/20 0.35
MMP9 P14780 1/20 0.35
GAA P10253 1/20 0.34
CNR2 P34972 1/20 0.34
MTNR1A P48039 1/20 0.34
MTNR1B P49286 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29323861 0.82 ELANE (0.51) ELANEKMT2AATMALDH1A1L3MBTL1
SCHEMBL29323883 0.80 ELANE (0.49) ELANEHPGDKMT2AATMALDH1A1
SCHEMBL29323860 0.79 ELANE (0.41) ELANEKMT2AATM
SCHEMBL29323743 0.78 ELANE (0.55) ELANEKMT2AATMALDH1A1HSD17B10
SCHEMBL11353850 0.75 ELANE (0.51) ELANEHPGDALDH1A1MMP2MMP9
SCHEMBL2431290 0.74 ELANE (0.64) ELANEKMT2AATML3MBTL1GAA
SCHEMBL29323877 0.72 KMT2A (0.40) ELANEKMT2AATMMMP2MMP9
SCHEMBL28062290 0.72 MAOB (0.62) ELANEALDH1A1L3MBTL1
SCHEMBL15058 0.72 ELANE (0.73) ELANEHPGDKMT2AATMALDH1A1
SCHEMBL87437 0.72 ELANE (0.73) ELANEHPGDKMT2AATMALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed