SCHEMBL29323883

SCHEMBL29323883

C=C(C)C(=O)Oc1ccc(C(CS(=O)(=O)CCOC(=O)c2ccccc2)CS(=O)(=O)CCOC(=O)c2ccccc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.49
LMNA P02545 2/20 0.39
TDP1 Q9NUW8 3/20 0.38
L3MBTL1 Q9Y468 2/20 0.37
MAPT P10636 5/20 0.36
KMT2A Q03164 5/20 0.36
KDM4E B2RXH2 2/20 0.36
HSP90AA1 P07900 2/20 0.36
ALDH1A1 P00352 4/20 0.36
MEN1 O00255 2/20 0.36
HPGD P15428 2/20 0.36
THRB P10828 1/20 0.35
POLB P06746 1/20 0.35
APEX1 P27695 1/20 0.35
HTT P42858 1/20 0.35
PKM P14618 1/20 0.34
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
PAX8 Q06710 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29323870 0.80 ELANE (0.49) ELANEL3MBTL1KMT2AALDH1A1HPGD
SCHEMBL29323860 0.78 ELANE (0.41) ELANETDP1KMT2AMEN1THRB
SCHEMBL29323861 0.77 ELANE (0.51) ELANETDP1L3MBTL1KMT2AALDH1A1
SCHEMBL12376766 0.77 ELANE (0.50) ELANELMNATDP1MAPTKMT2A
SCHEMBL4473581 0.73 ELANE (0.76) ELANELMNATDP1L3MBTL1MAPT
SCHEMBL24196259 0.73 ELANE (0.58) ELANELMNATDP1L3MBTL1MAPT
SCHEMBL29323873 0.73 THRB (0.41) LMNAMAPTKMT2AKDM4EMEN1
SCHEMBL26312823 0.72 POLB (0.49) ELANELMNATDP1MAPTKMT2A
SCHEMBL27785317 0.71 TDP1 (0.66) LMNATDP1L3MBTL1KMT2AKDM4E
SCHEMBL7073769 0.71 ALDH1A1 (0.57) ELANELMNATDP1MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed