⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9156920 | 0.81 | TSHR (0.50) | — | |
| SCHEMBL2933109 | 0.81 | HDAC3 (0.46) | — | |
| SCHEMBL853182 | 0.78 | ALDH1A1 (0.42) | — | |
| SCHEMBL19145814 | 0.78 | — | — | |
| SCHEMBL20880332 | 0.78 | — | — | |
| SCHEMBL24283906 | 0.78 | ALDH1A1 (0.44) | — | |
| SCHEMBL2933508 | 0.78 | ZDHHC20 (0.50) | — | |
| SCHEMBL748185 | 0.77 | — | — | |
| SCHEMBL8523785 | 0.77 | — | — | |
| SCHEMBL8926797 | 0.76 | ALDH1A1 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115572559-B | Anti-freezing optical cement and preparation method thereof | 中国科学院福建物质结构研究所 | 2023-11-17 | — | — | CN | claimed |
| CN-115572559-A | Anti-freezing optical cement and preparation method thereof | 中国科学院福建物质结构研究所 | 2023-01-06 | — | — | CN | claimed |
| CN-114614015-A | Water-based adhesive for lithium ion battery electrode and preparation method thereof | 山东奥赛新材料有限公司 | 2022-06-10 | — | — | CN | claimed |
| CN-115572559-B | Anti-freezing optical cement and preparation method thereof | 中国科学院福建物质结构研究所 | 2023-11-17 | — | — | CN | disclosed |
| CN-115572559-A | Anti-freezing optical cement and preparation method thereof | 中国科学院福建物质结构研究所 | 2023-01-06 | — | — | CN | disclosed |
| CN-114614015-A | Water-based adhesive for lithium ion battery electrode and preparation method thereof | 山东奥赛新材料有限公司 | 2022-06-10 | — | — | CN | disclosed |
| CN-107903560-B | A kind of polyacrylamide/microballoon plural gel and preparation method thereof | 中国石油大学(北京) | 2019-05-21 | — | — | CN | disclosed |
| CN-107903560-A | A kind of polyacrylamide/microballoon plural gel and preparation method thereof | 中国石油大学(北京) | 2018-04-13 | — | — | CN | disclosed |
| US-7732550-B2 | Stimuli-responsive polymer utilizing keto-enol tautomerization and stimuli-responsive separating material and chemical-releasing capsule comprising the same | AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY MITI (JP) | 2010-06-08 | — | — | US | disclosed |
| CN-101023138-B | Conductive composition and process for production thereof, antistatic coating material, antistatic membrane, antistatic film, optical filter, optical information recording media, and condenser and pro | SHINETSU POLYMER CO | 2010-05-05 | — | — | CN | disclosed |
| EP-0922715-B1 | Stimuli-responsive polymer utilizing keto-enol tautomerization | AGENCY IND SCIENCE TECHN (JP) | 2008-04-02 | — | — | EP | disclosed |
| EP-0716347-B1 | Developer for photosensitive lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2002-07-24 | — | — | EP | disclosed |
| EP-0730979-B1 | Support for lithographic printing plate, process for the preparation thereof and electrochemical roughening apparatus | FUJI PHOTO FILM CO LTD (JP) | 2000-08-30 | — | — | EP | disclosed |
| US-6030748-A | PHOTOSENSITIVE LAYER OF A HYDROLYZED AND POLYCONDENSED POLYMER OF ORGANOSILICONE OR ORGANOMETALLIC COMPOUND MONOMER IN A SOLVENT HAVING DISSOLVED THEREIN A PHENOL COMPOUND OR AN ORGANIC PHOSPHORIC ACID | FUJI PHOTO FILM CO., LTD. (JP) | 2000-02-29 | — | — | US | disclosed |
| EP-0922715-A2 | Stimuli-responsive polymer utilizing keto-enol tautomerization | AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY MITI (JP) | 1999-06-16 | — | — | EP | disclosed |
| EP-0907107-A2 | Package of photosensitive planographic printing plates and photosensitive planographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1999-04-07 | — | — | EP | disclosed |
| US-5837345-A | Support for lithographic printing plate, process for the preparation thereof and electrochemical roughening apparatus | FUJI PHOTO FILM CO., LTD. (JP) | 1998-11-17 | — | — | US | disclosed |
| US-5837425-A | PRESENSITIZATION OF PLATES, SUPPORTS, MULTILAYER, EXPOSURE TO ACTINIC RADIATION OF FILMS, DEVELOPMENT OF PLATES WITH ALKALI | FUJI PHOTO FILM CO., LTD. (JP) | 1998-11-17 | — | — | US | disclosed |
| EP-0730979-A2 | Support for lithographic printing plate, process for the preparation thereof and electrochemical roughening apparatus | FUJI PHOTO FILM CO., LTD. (JP) | 1996-09-11 | — | — | EP | disclosed |
| EP-0716347-A1 | Developer for photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1996-06-12 | — | — | EP | disclosed |