SCHEMBL293488

SCHEMBL293488

O=C(NC(C(Cl)(Cl)Cl)P(=O)(O)O)c1ccco1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.53
RAB9A P51151 1/20 0.53
ATM Q13315 1/20 0.53
ALDH1A1 P00352 14/20 0.52
MAPT P10636 7/20 0.52
KMT2A Q03164 6/20 0.52
MEN1 O00255 5/20 0.52
LMNA P02545 4/20 0.52
GAA P10253 1/20 0.51
PKM P14618 1/20 0.51
HPGD P15428 2/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
NPSR1 Q6W5P4 3/20 0.49
ALOX12 P18054 2/20 0.49
KDM4E B2RXH2 2/20 0.49
POLB P06746 1/20 0.49
CYP1A2 P05177 1/20 0.48
CYP3A4 P08684 1/20 0.48
CYP2D6 P10635 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15303030 0.80 RAB9A (0.57) NPC1RAB9AATMALDH1A1MAPT
SCHEMBL11551155 0.75 ALDH1A1 (0.58) NPC1RAB9AATMALDH1A1MAPT
SCHEMBL292487 0.74 SMN1; SMN2 (0.62) ATMALDH1A1MAPTKMT2AMEN1
SCHEMBL1923366 0.73 ALDH1A1 (0.72) NPC1RAB9AATMALDH1A1MAPT
SCHEMBL15922228 0.72 ALDH1A1 (0.55) ALDH1A1MAPTKMT2AMEN1LMNA
SCHEMBL15923425 0.72 CYP1A2 (0.64) NPC1RAB9AALDH1A1MAPTKMT2A
SCHEMBL1923000 0.72 ALDH1A1 (0.73) NPC1RAB9AALDH1A1MAPTKMT2A
SCHEMBL1923376 0.72 ALDH1A1 (0.58) NPC1RAB9AATMALDH1A1MAPT
SCHEMBL1923358 0.72 ALDH1A1 (0.61) NPC1RAB9AATMALDH1A1MAPT
SCHEMBL12156722 0.72 NPC1 (0.58) NPC1RAB9AATMALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8211286-B2 Electrolyte and method for depositing decorative and technical layers of black ruthenium Umicore Galvotechnik GmbH (DE) 2012-07-03 US claimed
EP-2310558-B1 IMPROVED COPPER-TIN ELECTROLYTE AND PROCESS FOR THE DEPOSITION OF TIN-BRONZE LAYERS UMICORE GALVANOTECHNIK GMBH (DE) 2012-03-14 EP claimed
JP-2011527381-A 2011-10-27 JP claimed
US-20110174631-A1 COPPER-TIN ELECTROLYTE AND PROCESS FOR THE DEPOSITION OF BRONZE LAYERS UMICORE GALVANOTECHNIK GMBH (DE) 2011-07-21 US claimed
EP-2310558-A1 IMPROVED COPPER-TIN ELECTROLYTE AND PROCESS FOR THE DEPOSITION OF BRONZE LAYERS Umicore Galvanotechnik GmbH (DE) 2011-04-20 EP claimed
US-20100147696-A1 COPPER-TIN ELECTROLYTE AND METHOD FOR DEPOSITING BRONZE LAYERS UMICORE GALVANOTECHNIK GMBH (DE) 2010-06-17 US claimed
US-20100051468-A1 ELECTROLYTE AND METHOD FOR DEPOSITING DECORATIVE AND TECHNICAL LAYERS OF BLACK RUTHENIUM UMICORE GALVANOTECHNIK GMBH (DE) 2010-03-04 US claimed
WO-2010003621-A1 IMPROVED COPPER-TIN ELECTROLYTE AND PROCESS FOR THE DEPOSITION OF BRONZE LAYERS UMICORE GALVANOTECHNIK GMBH (DE) 2010-01-14 WO claimed
EP-1961840-B1 Copper-tin electrolyte and method for depositing bronze layers UMICORE GALVANOTECHNIK GMBH (DE) 2009-12-30 EP claimed
EP-1975282-B1 Electrolyte and method for electroplating decorative and technical layers of black ruthenium. UMICORE GALVANOTECHNIK GMBH (DE) 2009-11-18 EP claimed
WO-2008116545-A1 ELECTROLYTE AND METHOD FOR DEPOSITING DECORATIVE AND TECHNICAL LAYERS OF BLACK RUTHENIUM UMICORE GALVANOTECHNIK GMBH (DE) 2008-10-02 WO claimed
EP-1975282-A1 Electrolyte and method for separating decorative and technical layers from black ruthenium Umicore Galvanotechnik GmbH (DE) 2008-10-01 EP claimed
EP-1961840-A1 Copper-tin electrolyte and method for depositing bronze layers Umicore Galvanotechnik GmbH (DE) 2008-08-27 EP claimed
WO-2008098666-A1 COPPER-TIN ELECTROLYTE AND METHOD FOR DEPOSITING BRONZE LAYERS UMICORE GALVANOTECHNIK GMBH (DE) 2008-08-21 WO claimed
US-11421335-B2 Electrolyte for the deposition of anthracite/black rhodium/ruthenium alloy layers UMICORE GALVANOTECHNIK GMBH (DE) 2022-08-23 US disclosed
US-20220136124-A1 Electrolyte for the Deposition of Anthracite/Black Rhodium/Ruthenium Alloy Layers UMICORE GALVANOTECHNIK GMBH (DE) 2022-05-05 US disclosed
US-8211286-B2 Electrolyte and method for depositing decorative and technical layers of black ruthenium Umicore Galvotechnik GmbH (DE) 2012-07-03 US disclosed
EP-1975282-A1 Electrolyte and method for separating decorative and technical layers from black ruthenium Umicore Galvanotechnik GmbH (DE) 2008-10-01 EP disclosed
EP-1961840-A1 Copper-tin electrolyte and method for depositing bronze layers Umicore Galvanotechnik GmbH (DE) 2008-08-27 EP disclosed
WO-2008098666-A1 COPPER-TIN ELECTROLYTE AND METHOD FOR DEPOSITING BRONZE LAYERS UMICORE GALVANOTECHNIK GMBH (DE) 2008-08-21 WO disclosed