Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2930671 | 0.87 | HPGD (0.32) | HTTALDH1A1MAPT | |
| SCHEMBL49475 | 0.87 | ALDH1A1 (0.37) | HTTALDH1A1POLBMAPT | |
| Hydrochloric Acid SCHEMBL2678849 | 0.81 | HTT (0.35) | HTTALDH1A1POLBMAPT | |
| SCHEMBL15453411 | 0.75 | ALDH1A1 (0.36) | HTTALDH1A1POLBMAPT | |
| SCHEMBL1191991 | 0.74 | SMN1; SMN2 (0.32) | ALDH1A1POLBMAPT | |
| Hydrochloric Acid SCHEMBL28670531 | 0.73 | SMN1; SMN2 (0.31) | — | |
| SCHEMBL1453093 | 0.73 | ALDH1A1 (0.38) | ALDH1A1POLBMAPT | |
| Hydrochloric Acid SCHEMBL22362253 | 0.72 | ALDH1A1 (0.40) | HTTALDH1A1POLBMAPT | |
| SCHEMBL4238141 | 0.70 | SIGMAR1 (0.47) | — | |
| SCHEMBL645257 | 0.69 | GRIN1 (0.35) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1296365-B1 | Method of film formation | JSR CORP (JP) | 2010-09-22 | — | — | EP | disclosed |
| US-6890605-B2 | Method of film formation, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2005-05-10 | — | — | US | disclosed |
| US-20030059550-A1 | Method of film formation, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2003-03-27 | — | — | US | disclosed |
| EP-1296365-A2 | Method of film formation, insulating film, and substrate for semiconductor | JSR Corporation (JP) | 2003-03-26 | — | — | EP | disclosed |