SCHEMBL29368642

SCHEMBL29368642

CCCCCc1ccc2c(OC(=O)CCCC)c3ccccc3c(OC(=O)CCCC)c2c1

nearest known ligand 0.44

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.44
MEN1 O00255 1/20 0.44
RECQL P46063 1/20 0.44
KMT2A Q03164 1/20 0.44
GABRA1 P14867 2/20 0.43
GABRB2 P47870 2/20 0.43
ALOX15 P16050 1/20 0.43
RORA P35398 1/20 0.43
RORC P51449 1/20 0.43
RORB Q92753 1/20 0.43
PPARA Q07869 4/20 0.41
PPARG P37231 3/20 0.41
KAT8 Q9H7Z6 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C19 P33261 1/20 0.41
THRB P10828 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29370951 0.97 ALOX15 (0.46) KDM4EMEN1RECQLKMT2AALOX15
SCHEMBL29372433 0.96 ALOX15 (0.45) ALOX15RORARORCRORBPPARA
SCHEMBL29369097 0.96 RORA (0.43) GABRA1GABRB2ALOX15RORARORC
SCHEMBL23271804 0.89 KDM4E (0.46) KDM4EMEN1RECQLKMT2AGABRA1
SCHEMBL29372033 0.89 KDM4E (0.46) KDM4EMEN1RECQLKMT2AGABRA1
SCHEMBL29372110 0.88 ALOX15 (0.47) KDM4EMEN1RECQLKMT2AGABRA1
SCHEMBL20398709 0.88 ALOX15 (0.47) KDM4EMEN1RECQLKMT2AGABRA1
SCHEMBL20398516 0.87 ALOX15 (0.46) KDM4EMEN1RECQLKMT2AALOX15
SCHEMBL20398422 0.87 ALOX15 (0.46) KDM4EMEN1RECQLKMT2AALOX15
SCHEMBL20398441 0.87 ALOX15 (0.46) KDM4EMEN1RECQLKMT2AALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed