SCHEMBL29370951

SCHEMBL29370951

CCCCCC(=O)Oc1c2ccccc2c(OC(=O)CCCCC)c2cc(CCCCC)ccc12

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.46
RORA P35398 1/20 0.43
RORC P51449 1/20 0.43
RORB Q92753 1/20 0.43
EPHX2 P34913 1/20 0.42
FAAH O00519 1/20 0.42
PPARA Q07869 2/20 0.41
PPARG P37231 1/20 0.41
CNR2 P34972 1/20 0.41
KAT8 Q9H7Z6 2/20 0.41
KDM4E B2RXH2 1/20 0.41
MEN1 O00255 1/20 0.41
RECQL P46063 1/20 0.41
KMT2A Q03164 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C19 P33261 1/20 0.41
THRB P10828 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29372433 0.99 ALOX15 (0.45) ALOX15RORARORCRORBEPHX2
SCHEMBL29368642 0.97 KDM4E (0.44) ALOX15RORARORCRORBPPARA
SCHEMBL29369097 0.96 RORA (0.43) ALOX15RORARORCRORBPPARA
SCHEMBL20398709 0.91 ALOX15 (0.47) ALOX15RORARORCRORBEPHX2
SCHEMBL29372110 0.91 ALOX15 (0.47) ALOX15RORARORCRORBEPHX2
SCHEMBL23271877 0.90 ALOX15 (0.46) ALOX15EPHX2KDM4EMEN1RECQL
SCHEMBL20398516 0.90 ALOX15 (0.46) ALOX15EPHX2KDM4EMEN1RECQL
SCHEMBL20398422 0.90 ALOX15 (0.46) ALOX15EPHX2KDM4EMEN1RECQL
SCHEMBL20398555 0.90 ALOX15 (0.46) ALOX15EPHX2KDM4EMEN1RECQL
SCHEMBL20398441 0.90 ALOX15 (0.46) ALOX15EPHX2KDM4EMEN1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111413849-B Photosensitive composition, preparation method thereof, pattern forming method and application 常州强力先端电子材料有限公司 2024-03-01 CN disclosed
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-114114839-A Photosensitive resin composition, patterning method and application of photosensitive resin composition 常州强力先端电子材料有限公司 2022-03-01 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed