SCHEMBL29370930

SCHEMBL29370930

Cc1ccc2c(OC(=O)c3ccccc3)c3ccccc3c(OC(=O)c3ccccc3)c2c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 5/20 0.51
MAPT P10636 5/20 0.51
LMNA P02545 3/20 0.51
POLB P06746 2/20 0.51
KMT2A Q03164 9/20 0.47
ALDH1A1 P00352 5/20 0.47
NPSR1 Q6W5P4 3/20 0.47
PKM P14618 2/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
NOD2 Q9HC29 1/20 0.45
MEN1 O00255 4/20 0.44
ESR1 P03372 3/20 0.44
ESR2 Q92731 3/20 0.44
KDM4E B2RXH2 1/20 0.44
GLA P06280 1/20 0.44
NPBWR1 P48145 1/20 0.44
HTT P42858 1/20 0.43
TSHR P16473 1/20 0.43
NPC1 O15118 1/20 0.43
RAB9A P51151 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29371748 0.94 KMT2A (0.53) GAAMAPTLMNAPOLBKMT2A
SCHEMBL23152131 0.84 ALDH1A1 (0.60) GAAMAPTLMNAPOLBKMT2A
SCHEMBL29372159 0.84 ALDH1A1 (0.60) GAAMAPTLMNAPOLBKMT2A
SCHEMBL29372731 0.84 LMNA (0.56) GAAMAPTLMNAPOLBKMT2A
SCHEMBL29371306 0.84 NPC1 (0.51) GAAMAPTPOLBKMT2AALDH1A1
SCHEMBL29371517 0.82 KMT2A (0.50) GAAMAPTLMNAPOLBKMT2A
SCHEMBL29372029 0.82 MAPT (0.52) GAAMAPTLMNAPOLBKMT2A
SCHEMBL29372682 0.81 HTT (0.58) GAAMAPTLMNAPOLBKMT2A
SCHEMBL20398467 0.81 HTT (0.58) GAAMAPTLMNAPOLBKMT2A
SCHEMBL29368549 0.81 MAPT (0.52) GAAMAPTLMNAPOLBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-114114839-A Photosensitive resin composition, patterning method and application of photosensitive resin composition 常州强力先端电子材料有限公司 2022-03-01 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed