SCHEMBL29371306

SCHEMBL29371306

Cc1ccc2c(OC(=O)c3ccc4ccccc4c3)c3ccccc3c(OC(=O)c3ccc4ccccc4c3)c2c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.51
RAB9A P51151 3/20 0.51
FNTA P49354 1/20 0.45
FNTB P49356 1/20 0.45
KMT2A Q03164 5/20 0.44
ALDH1A1 P00352 4/20 0.44
MAPT P10636 2/20 0.44
TDP1 Q9NUW8 2/20 0.44
MEN1 O00255 2/20 0.44
HPGD P15428 2/20 0.44
ESR1 P03372 3/20 0.44
CES2 O00748 1/20 0.44
CES1 P23141 1/20 0.44
CYP2A6 P11509 2/20 0.43
ESR2 Q92731 2/20 0.43
POLB P06746 1/20 0.43
GAA P10253 2/20 0.42
PKM P14618 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29371984 0.88 CES2 (0.55) NPC1RAB9AKMT2AALDH1A1MAPT
SCHEMBL29371748 0.87 KMT2A (0.53) NPC1RAB9AKMT2AALDH1A1MAPT
SCHEMBL29370930 0.84 GAA (0.51) NPC1RAB9AKMT2AALDH1A1MAPT
SCHEMBL29371838 0.84 CYP1A2 (0.49) NPC1RAB9AKMT2AALDH1A1MAPT
SCHEMBL29370980 0.83 KMT2A (0.46) NPC1RAB9AKMT2AALDH1A1MAPT
SCHEMBL29371896 0.83 LMNA (0.51) NPC1RAB9AKMT2AALDH1A1MAPT
SCHEMBL29371490 0.83 MAPT (0.44) NPC1RAB9AKMT2AALDH1A1MAPT
SCHEMBL29370946 0.83 MAPT (0.46) NPC1RAB9AKMT2AALDH1A1MAPT
SCHEMBL29371693 0.81 NPC1 (0.44) NPC1RAB9AFNTAFNTBKMT2A
SCHEMBL14206802 0.79 NPC1 (0.62) NPC1RAB9AFNTAFNTBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed