SCHEMBL29370950

SCHEMBL29370950

CCOC(=O)OC1=c2ccccc2=C2C(=O)C(OC(=O)OCC)=c3cc(CC)ccc3=C2C1=O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.39
ALDH1A1 P00352 7/20 0.39
LMNA P02545 7/20 0.39
NPSR1 Q6W5P4 6/20 0.39
KMT2A Q03164 6/20 0.39
MEN1 O00255 5/20 0.39
HPGD P15428 5/20 0.39
SMN1; SMN2 Q16637 5/20 0.39
ALOX12 P18054 4/20 0.39
TDP1 Q9NUW8 4/20 0.39
HTT P42858 3/20 0.39
PKM P14618 2/20 0.39
STAT3 P40763 1/20 0.39
KCNH2 Q12809 1/20 0.39
GABRA1 P14867 2/20 0.38
GABRB2 P47870 2/20 0.38
KDM4E B2RXH2 5/20 0.38
HKDC1 Q2TB90 4/20 0.38
L3MBTL1 Q9Y468 4/20 0.38
CCR6 P51684 3/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29371941 0.90 ALDH1A1 (0.39) MAPTALDH1A1LMNANPSR1KMT2A
SCHEMBL29371990 0.88 ALDH1A1 (0.41) MAPTALDH1A1LMNANPSR1KMT2A
SCHEMBL29368396 0.88 ALDH1A1 (0.40) MAPTALDH1A1LMNANPSR1KMT2A
SCHEMBL29372369 0.88 ELANE (0.44) MAPTALDH1A1LMNAKMT2AMEN1
SCHEMBL29371997 0.88 TSHR (0.42) MAPTALDH1A1LMNANPSR1KMT2A
SCHEMBL29370983 0.87 RAB9A (0.40) MAPTALDH1A1LMNANPSR1KMT2A
SCHEMBL29371462 0.87 KMT2A (0.38) MAPTALDH1A1LMNANPSR1KMT2A
SCHEMBL29371730 0.86 MAPT (0.39) MAPTALDH1A1LMNANPSR1KMT2A
SCHEMBL29371905 0.86 MAPT (0.41) MAPTALDH1A1LMNANPSR1KMT2A
SCHEMBL29371846 0.85 PREP (0.40) MAPTALDH1A1LMNANPSR1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed