SCHEMBL29371990

SCHEMBL29371990

CCc1ccc2c(c1)=C(OC(=O)OC)C(=O)C1=c3ccccc3=C(OC(=O)OC)C(=O)C=21

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.41
LMNA P02545 8/20 0.41
MAPT P10636 8/20 0.41
SMN1; SMN2 Q16637 5/20 0.41
RAB9A P51151 3/20 0.41
L3MBTL1 Q9Y468 3/20 0.41
NPC1 O15118 2/20 0.41
MAPK1 P28482 2/20 0.41
FGFR1 P11362 1/20 0.36
SRC P12931 1/20 0.36
FGFR2 P21802 1/20 0.36
FGFR4 P22455 1/20 0.36
FGFR3 P22607 1/20 0.36
KDM4E B2RXH2 7/20 0.36
NPSR1 Q6W5P4 6/20 0.36
KMT2A Q03164 6/20 0.36
TDP1 Q9NUW8 5/20 0.36
MEN1 O00255 5/20 0.36
HTT P42858 4/20 0.36
HKDC1 Q2TB90 4/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29368379 0.89 ALDH1A1 (0.38) ALDH1A1LMNAMAPTSMN1; SMN2RAB9A
SCHEMBL29370950 0.88 MAPT (0.39) ALDH1A1LMNAMAPTSMN1; SMN2RAB9A
SCHEMBL29370983 0.88 RAB9A (0.40) ALDH1A1LMNAMAPTSMN1; SMN2RAB9A
SCHEMBL29371905 0.87 MAPT (0.41) ALDH1A1LMNAMAPTSMN1; SMN2RAB9A
SCHEMBL29368396 0.87 ALDH1A1 (0.40) ALDH1A1LMNAMAPTSMN1; SMN2RAB9A
SCHEMBL29371846 0.86 PREP (0.40) ALDH1A1LMNAMAPTSMN1; SMN2RAB9A
SCHEMBL29371941 0.86 ALDH1A1 (0.39) ALDH1A1LMNAMAPTSMN1; SMN2RAB9A
SCHEMBL29371320 0.85 MAPT (0.39) ALDH1A1LMNAMAPTSMN1; SMN2RAB9A
SCHEMBL29368620 0.84 KDM4E (0.43) ALDH1A1LMNAMAPTSMN1; SMN2RAB9A
SCHEMBL29372712 0.84 MAPT (0.41) ALDH1A1LMNAMAPTSMN1; SMN2RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed