Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | HCAR2 | Q8TDS4 | 3/20 | 0.38 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | NAAA | Q02083 | 1/20 | 0.33 |
| ▸ | AR | P10275 | 1/20 | 0.33 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29619472 | 0.92 | NAAA (0.40) | HCAR2TSHRNAAANPC1RAB9A | |
| SCHEMBL30295572 | 0.91 | NAAA (0.42) | HCAR2TSHRNAAANPC1RAB9A | |
| SCHEMBL30582773 | 0.91 | NAAA (0.42) | HCAR2TSHRNAAANPC1RAB9A | |
| SCHEMBL30341731 | 0.91 | NAAA (0.42) | HCAR2TSHRNAAANPC1RAB9A | |
| SCHEMBL30582775 | 0.91 | NAAA (0.42) | HCAR2TSHRNAAANPC1RAB9A | |
| SCHEMBL30582827 | 0.91 | NAAA (0.42) | HCAR2TSHRNAAANPC1RAB9A | |
| SCHEMBL29419059 | 0.91 | NAAA (0.42) | HCAR2TSHRNAAANPC1RAB9A | |
| SCHEMBL4735967 | 0.91 | NAAA (0.42) | HCAR2TSHRNAAANPC1RAB9A | |
| SCHEMBL30095427 | 0.83 | ACLY (0.44) | NPSR1MAPT | |
| SCHEMBL30090581 | 0.83 | TET2 (0.35) | ALDH1A1HCAR2TSHRTET2TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118899539-A | Preparation method of lithium ion battery high-entropy ester electrolyte suitable for ultralow-temperature working condition | 中国科学院大连化学物理研究所 | 2024-11-05 | — | — | CN | claimed |
| CN-118899544-A | Low-temperature electrolyte containing double solvents and application of low-temperature electrolyte in lithium-sulfur battery | 中国科学院大连化学物理研究所 | 2024-11-05 | — | — | CN | claimed |
| US-20250289969-A1 | INKJET INK | GENERAL CO., LTD. (JP) | 2025-09-18 | — | — | US | disclosed |
| EP-4617334-A1 | INKJET INK | General Co., Ltd. (JP) | 2025-09-17 | — | — | EP | disclosed |
| CN-119937243-A | Chemically amplified positive photosensitive resin composition, cured film, and element having cured film | 奇美实业股份有限公司 | 2025-05-06 | — | — | CN | disclosed |
| CN-119828412-A | Composition for removing edge bead, developer composition, and method for forming pattern | 三星SDI株式会社 | 2025-04-15 | — | — | CN | disclosed |
| CN-116917425-B | Coating material, coating film, laminate, and flexible flat cable | 理研科技株式会社 | 2025-03-18 | — | — | CN | disclosed |
| CN-118899539-A | Preparation method of lithium ion battery high-entropy ester electrolyte suitable for ultralow-temperature working condition | 中国科学院大连化学物理研究所 | 2024-11-05 | — | — | CN | disclosed |
| CN-118899544-A | Low-temperature electrolyte containing double solvents and application of low-temperature electrolyte in lithium-sulfur battery | 中国科学院大连化学物理研究所 | 2024-11-05 | — | — | CN | disclosed |
| US-20240228814-A9 | COATING MATERIAL, COATING FILM, LAYERED PRODUCT, AND FLEXIBLE FLAT CABLE | RIKEN TECHNOS CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| CN-117209980-B | Polyhydroxyalkanoate composition, polyhydroxyalkanoate molded body and preparation method of polyhydroxyalkanoate molded body | 北京蓝晶微生物科技有限公司 | 2024-04-30 | — | — | CN | disclosed |
| CN-108415221-B | Photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-07-28 | — | — | CN | disclosed |
| CN-116360211-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2023-06-30 | — | — | CN | disclosed |
| CN-111381438-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-06-20 | — | — | CN | disclosed |
| CN-109062007-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2023-03-10 | — | — | CN | disclosed |
| CN-115524926-A | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2022-12-27 | — | — | CN | disclosed |
| EP-3816244-B1 | INJET INK, HIDING LAYER COATING AGENT, RECORDING SHEET AND METHOD FOR MANUFACTURING THE SAME, RECORDED PRODUCT AND METHOD FOR MANUFACTURING THE SAME, AND IMAGE RECORDING INK | GEN CO LTD (JP) | 2022-12-07 | — | — | EP | disclosed |
| CN-115437214-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2022-12-06 | — | — | CN | disclosed |
| CN-108693710-B | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2022-12-02 | — | — | CN | disclosed |
| CN-107179652-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2022-02-08 | — | — | CN | disclosed |