SCHEMBL29375595

SCHEMBL29375595

COc1cc(C(c2ccc(O)cc2)c2ccc(O)cc2)ccc1O

nearest known ligand 0.62

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAOB P27338 2/20 0.62
TSHR P16473 2/20 0.57
CYP3A4 P08684 1/20 0.57
BLM P54132 2/20 0.56
NFKB1 P19838 1/20 0.56
NPSR1 Q6W5P4 1/20 0.56
PMP22 Q01453 1/20 0.54
BCHE P06276 2/20 0.53
TYR P14679 2/20 0.53
ACHE P22303 2/20 0.53
GAA P10253 2/20 0.52
SLC22A3 O75751 1/20 0.50
ABCB1 P08183 1/20 0.48
AKR1B1 P15121 1/20 0.48
MAOA P21397 1/20 0.48
CYP19A1 P11511 1/20 0.48
NQO1 P15559 1/20 0.47
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8768786 1.00 MAOB (0.62) MAOBTSHRCYP3A4BLMNFKB1
SCHEMBL3413913 1.00 MAOB (0.62) MAOBTSHRCYP3A4BLMNFKB1
SCHEMBL757257 1.00 MAOB (0.62) MAOBTSHRCYP3A4BLMNFKB1
SCHEMBL8146274 1.00 MAOB (0.62) MAOBTSHRCYP3A4BLMNFKB1
SCHEMBL1596291 0.94 TSHR (0.62) MAOBTSHRCYP3A4BLMNFKB1
SCHEMBL20563424 0.92 TSHR (0.65) MAOBTSHRCYP3A4BLMNFKB1
SCHEMBL31516847 0.87 TSHR (0.59) MAOBTSHRCYP3A4BLMNFKB1
SCHEMBL30826323 0.84 TSHR (0.56) MAOBTSHRCYP3A4BLMNFKB1
SCHEMBL2865089 0.84 TSHR (0.56) MAOBTSHRCYP3A4BLMNFKB1
SCHEMBL1758407 0.84 BCHE (0.44) MAOBTSHRCYP3A4BLMNFKB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119620544-A Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article 东京应化工业株式会社 2025-03-14 CN disclosed
CN-112750865-B Display panel 三星显示有限公司 2024-12-13 CN disclosed
CN-113544585-B Photosensitive resin composition, photosensitive resin sheet, cured film, method for producing cured film, organic EL display device, and electronic component 东丽株式会社 2024-10-22 CN disclosed
CN-118251632-A Photosensitive resin composition, cured product, method for producing cured product, organic EL display device, and display device 东丽株式会社 2024-06-25 CN disclosed
CN-117480218-A Xanthene compound, resin composition, cured product, method for producing cured product, organic EL display device, and display device 东丽株式会社 2024-01-30 CN disclosed
CN-117043676-A Positive photosensitive pigment composition, cured film containing cured product thereof, and organic EL display device 东丽株式会社 2023-11-10 CN disclosed
CN-116360213-A Resin composition and photoresist patterning method using the same 深圳市容大感光科技股份有限公司 2023-06-30 CN disclosed
CN-113785023-B Water-based ink composition for reversible thermochromic writing instrument, refill for refill and water-based ballpoint pen incorporating same 株式会社百乐 2023-05-12 CN disclosed
CN-109062007-B Positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2023-03-10 CN disclosed
US-11522035-B2 Display panel SAMSUNG DISPLAY CO., LTD. (KR) 2022-12-06 US disclosed
CN-108693710-B Positive photosensitive polysiloxane composition 奇美实业股份有限公司 2022-12-02 CN disclosed
CN-107561863-B Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2022-09-16 CN disclosed
CN-107870516-B Positive photosensitive resin composition, patterned film and method for manufacturing bump 奇美实业股份有限公司 2022-08-02 CN disclosed
CN-106715597-B Resin composition, method for producing heat-resistant resin film, and display device 东丽株式会社 2022-03-01 CN disclosed
CN-107179652-B Positive photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2022-02-08 CN disclosed