SCHEMBL2940491

SCHEMBL2940491

C=C(C)C(=O)OCCC(F)C(F)(F)S(=O)(=O)O.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.34

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
HTT P42858 3/20 0.34
POLB P06746 1/20 0.34
APEX1 P27695 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
THRB P10828 1/20 0.31
TSHR P16473 4/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
ELANE P08246 1/20 0.30
MAPT P10636 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2742237 0.87 THRB (0.40) HTTPOLBAPEX1TDP1THRB
SCHEMBL1261674 0.78 ELANE (0.34) HTTPOLBAPEX1TDP1TSHR
SCHEMBL14985840 0.78 TDP1 (0.49) TDP1TSHRKMT2ASMN1; SMN2
SCHEMBL2391740 0.78 ALDH1A1 (0.34) HTTTSHRMEN1KMT2AMAPT
SCHEMBL6117936 0.77 ELANE (0.33) ELANE
SCHEMBL2940493 0.76 HTT (0.32) HTTTSHRMEN1KMT2AMAPT
SCHEMBL26488812 0.76
SCHEMBL1634141 0.74 HTT (0.36) HTTPOLBAPEX1TDP1THRB
SCHEMBL31478315 0.74 TDP1 (0.48) HTTPOLBAPEX1TDP1THRB
Lithium Ion SCHEMBL17438932 0.74 THRB (0.38) HTTPOLBAPEX1TDP1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9223204-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same FUJITSU CORPORATION (JP) 2015-12-29 US disclosed
US-20140127627-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME ITO TAKAYUKI (JP) 2014-05-08 US disclosed
US-8329379-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same FUJIFILM CORPORATION (JP) 2012-12-11 US disclosed
US-20100248143-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-09-30 US disclosed