Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | APEX1 | P27695 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26488812 | 0.88 | — | — | |
| SCHEMBL2940491 | 0.87 | HTT (0.34) | THRBTSHRPOLBAPEX1HTT | |
| Lithium Ion SCHEMBL17438932 | 0.85 | THRB (0.38) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL21679529 | 0.85 | THRB (0.38) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL12256924 | 0.84 | TSHR (0.49) | THRBTSHRALDH1A1 | |
| SCHEMBL17490953 | 0.84 | ALOX15 (0.37) | TSHRALDH1A1HTTTDP1 | |
| SCHEMBL2742244 | 0.82 | THRB (0.36) | THRBTSHR | |
| SCHEMBL13828909 | 0.78 | PRKCA (0.33) | POLB | |
| SCHEMBL13048511 | 0.77 | TSHR (0.42) | THRBTSHRALDH1A1 | |
| SCHEMBL29869300 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023171670-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2023-09-14 | — | — | WO | disclosed |
| US-20230013430-A1 | SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE | TOYO GOSEI CO., LTD. (JP) | 2023-01-19 | — | — | US | disclosed |
| US-11142495-B2 | Composition and method for manufacturing device using same | TOYO GOSEI CO., LTD. (JP) | 2021-10-12 | — | — | US | disclosed |
| US-20200048191-A1 | COMPOSITION AND METHOD FOR MANUFACTURING DEVICE USING SAME | TOYO GOSEI CO., LTD. (JP) | 2020-02-13 | — | — | US | disclosed |
| US-10179778-B2 | Substituted aryl onium materials | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-01-15 | — | — | US | disclosed |
| US-9594303-B2 | Resist pattern-forming method and photoresist composition | JSR CORPORATION (JP) | 2017-03-14 | — | — | US | disclosed |
| US-9594303-B2 | Resist pattern-forming method and photoresist composition | JSR CORPORATION (JP) | 2017-03-14 | — | — | US | disclosed |
| US-9568824-B2 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2017-02-14 | — | — | US | disclosed |
| US-9568824-B2 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2017-02-14 | — | — | US | disclosed |
| US-20160168117-A1 | ARYL ACETATE ONIUM MATERIALS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-06-16 | — | — | US | disclosed |
| US-8632945-B2 | Radiation-sensitive resin composition, monomer, polymer, and production method of radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-01-21 | — | — | US | disclosed |
| US-8632945-B2 | Radiation-sensitive resin composition, monomer, polymer, and production method of radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-01-21 | — | — | US | disclosed |
| US-20120237876-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUCTION METHOD OF RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| US-20120237876-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUCTION METHOD OF RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| US-20120082939-A1 | ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120034559-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20120003583-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110318693-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110183263-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-28 | — | — | US | disclosed |
| US-20100183975-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD USING THE SAME, AND RESIN | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230013430-A1 | SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE | ARSA, SULT1A1, RER1 | THRB 1664/4885TSHR 955/4885ALDH1A1 1281/4885 |
| US-20200048191-A1 | COMPOSITION AND METHOD FOR MANUFACTURING DEVICE USING SAME | LBR, LMTK2, MMS19 | THRB 4482/4885TSHR 2146/4885ALDH1A1 4785/4885 |
| US-20120237876-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUCTION METHOD OF RADIATION-SENSITIVE RESIN COMPOSITION | RAD51, RAD54L, MRE11 | THRB 3465/4885TSHR 2828/4885ALDH1A1 2031/4885 |
| US-20160168117-A1 | ARYL ACETATE ONIUM MATERIALS | NAT1, AHR, AADAC | THRB 2176/4885TSHR 2284/4885ALDH1A1 118/4885 |
| US-11142495-B2 | Composition and method for manufacturing device using same | LBR, LMTK2, MMS19 | THRB 4482/4885TSHR 2146/4885ALDH1A1 4785/4885 |
| US-10179778-B2 | Substituted aryl onium materials | AHR, DDT, ARNT | THRB 3609/4885TSHR 3446/4885ALDH1A1 1344/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.