Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 7/20 | 1.00 |
| ▸ | KMT2A | Q03164 | 7/20 | 1.00 |
| ▸ | MAPT | P10636 | 6/20 | 1.00 |
| ▸ | RAB9A | P51151 | 5/20 | 1.00 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 1.00 |
| ▸ | APP | P05067 | 3/20 | 1.00 |
| ▸ | INSR | P06213 | 2/20 | 1.00 |
| ▸ | NCOA1 | Q15788 | 1/20 | 1.00 |
| ▸ | NPC1 | O15118 | 2/20 | 0.73 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.73 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.73 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.73 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.73 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.73 |
| ▸ | KAT8 | Q9H7Z6 | 1/20 | 0.58 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.56 |
| ▸ | LMNA | P02545 | 2/20 | 0.56 |
| ▸ | ATP4A | P20648 | 8/20 | 0.55 |
| ▸ | ATP4B | P51164 | 8/20 | 0.55 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29413750 | 1.00 | MEN1 (1.00) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL476578 | 1.00 | MEN1 (1.00) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL476579 | 1.00 | MEN1 (1.00) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| Iodide SCHEMBL8390905 | 0.99 | MEN1 (0.97) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| Iodide SCHEMBL8390903 | 0.99 | MEN1 (0.97) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| Bromide SCHEMBL8389954 | 0.99 | MEN1 (0.97) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| Bromide SCHEMBL8389953 | 0.99 | MEN1 (0.97) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL9841114 | 0.92 | MEN1 (0.84) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL31447671 | 0.92 | MEN1 (0.84) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL29409733 | 0.92 | MEN1 (0.84) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120153318-A | Photosensitive resin composition, method for producing cured relief pattern using same, and method for producing polyimide film | 旭化成株式会社 | 2025-06-13 | — | — | CN | disclosed |
| CN-120129875-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2025-06-10 | — | — | CN | disclosed |
| CN-120129876-A | Negative photosensitive resin composition, method for producing polyimide cured film using same, and polyimide cured film | 旭化成株式会社 | 2025-06-10 | — | — | CN | disclosed |
| CN-120077104-A | Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device | 富士胶片株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-116648313-B | Resin composition, cured product, laminate, method for producing cured product, and semiconductor device | 富士胶片株式会社 | 2025-05-16 | — | — | CN | disclosed |
| CN-119998728-A | Film manufacturing method, photosensitive resin composition, cured product manufacturing method, cured product, and laminate | 富士胶片株式会社 | 2025-05-13 | — | — | CN | disclosed |
| CN-119968421-A | Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device | 富士胶片株式会社 | 2025-05-09 | — | — | CN | disclosed |
| CN-119937247-A | Curable resin composition, resin film, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2025-05-06 | — | — | CN | disclosed |
| CN-119866360-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2025-04-22 | — | — | CN | disclosed |
| CN-119856108-A | Liquid crystal aligning agent and liquid crystal display element | 日产化学株式会社 | 2025-04-18 | — | — | CN | disclosed |
| CN-109153857-B | Polarizing layer forming composition | 日产化学株式会社 | 2022-04-26 | — | — | CN | disclosed |
| CN-109154685-B | Alignment layer forming composition | 日产化学株式会社 | 2022-04-19 | — | — | CN | disclosed |
| WO-2022064917-A1 | CURED PRODUCT PRODUCTION METHOD, LAMINATE PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD | 富士フイルム株式会社 | 2022-03-31 | — | — | WO | disclosed |
| CN-114249912-A | Method for producing polyimide cured film | 旭化成株式会社 | 2022-03-29 | — | — | CN | disclosed |
| CN-114253076-A | Photosensitive resin composition | 旭化成株式会社 | 2022-03-29 | — | — | CN | disclosed |
| CN-114207522-A | Negative photosensitive resin composition, method for producing polyimide, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2022-03-18 | — | — | CN | disclosed |
| CN-114174907-A | Transverse electric field liquid crystal display element and method for manufacturing transverse electric field liquid crystal cell | 日产化学株式会社 | 2022-03-11 | — | — | CN | disclosed |
| CN-109476926-B | Polymer composition | 日产化学株式会社 | 2022-03-04 | — | — | CN | disclosed |
| CN-108475023-B | Photosensitive resin composition, dry film, cured product and printed wiring board | 太阳控股株式会社 | 2022-02-25 | — | — | CN | disclosed |
| CN-114008526-A | Curable resin composition, method for producing curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2022-02-01 | — | — | CN | disclosed |