SCHEMBL476579

SCHEMBL476579

CN(C)c1ccc(C=Cc2nc3ccccc3s2)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 7/20 1.00
▸ KMT2A Q03164 7/20 1.00
▸ MAPT P10636 6/20 1.00
▸ RAB9A P51151 5/20 1.00
▸ SMN1; SMN2 Q16637 3/20 1.00
▸ APP P05067 3/20 1.00
▸ INSR P06213 2/20 1.00
▸ NCOA1 Q15788 1/20 1.00
▸ NPC1 O15118 2/20 0.73
▸ CYP1A2 P05177 1/20 0.73
▸ CYP3A4 P08684 1/20 0.73
▸ CYP2D6 P10635 1/20 0.73
▸ CYP2C19 P33261 1/20 0.73
▸ NPSR1 Q6W5P4 1/20 0.73
▸ KAT8 Q9H7Z6 1/20 0.58
▸ L3MBTL1 Q9Y468 3/20 0.56
▸ LMNA P02545 2/20 0.56
▸ ATP4A P20648 8/20 0.55
▸ ATP4B P51164 8/20 0.55
▸ TDP1 Q9NUW8 2/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29413750 1.00 MEN1 (1.00) MEN1KMT2AMAPTRAB9ASMN1; SMN2
SCHEMBL29433017 1.00 MEN1 (1.00) MEN1KMT2AMAPTRAB9ASMN1; SMN2
SCHEMBL476578 1.00 MEN1 (1.00) MEN1KMT2AMAPTRAB9ASMN1; SMN2
Iodide SCHEMBL8390905 0.99 MEN1 (0.97) MEN1KMT2AMAPTRAB9ASMN1; SMN2
Iodide SCHEMBL8390903 0.99 MEN1 (0.97) MEN1KMT2AMAPTRAB9ASMN1; SMN2
Bromide SCHEMBL8389954 0.99 MEN1 (0.97) MEN1KMT2AMAPTRAB9ASMN1; SMN2
Bromide SCHEMBL8389953 0.99 MEN1 (0.97) MEN1KMT2AMAPTRAB9ASMN1; SMN2
SCHEMBL9841114 0.92 MEN1 (0.84) MEN1KMT2AMAPTRAB9ASMN1; SMN2
SCHEMBL31447671 0.92 MEN1 (0.84) MEN1KMT2AMAPTRAB9ASMN1; SMN2
SCHEMBL29409733 0.92 MEN1 (0.84) MEN1KMT2AMAPTRAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 721 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115160569-B Photosensitive polyamic acid ester resin, resin composition and electronic component 明士(北京)新材料开发有限公司 2022-12-27 — — CN claimed
CN-111522200-B Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof 中国科学院化学研究所 2021-07-27 — — CN claimed
CN-111522200-A Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof 中国科学院化学研究所 2020-08-11 — — CN claimed
EP-0721336-A1 BENZAZOLE COMPOUNDS FOR USE IN THERAPY CANCER RESEARCH CAMPAIGN TECHNOLOGY LIMITED (GB) 1996-07-17 — — EP claimed
WO-1995006469-A1 BENZAZOLE COMPOUNDS FOR USE IN THERAPY CANCER RESEARCH CAMPAIGN TECHNOLOGY LIMITED (GB) 1995-03-09 — — WO claimed
US-4985470-A Three component photoinitiator system, printing plates, photoresists, inks, paints, adhesives MITSUBISHI KASEI CORPORATION (JP) 1991-01-15 — — US claimed
EP-0073304-B1 A METHOD OF STORING DATA IN A STORAGE DEVICE International Business Machines Corporation (US) 1986-02-12 — — EP claimed
US-4538252-A Light induced capacitance changes in donor polymers (or small molecules) films and its use for information storage in video disks and the like INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1985-08-27 — — US claimed
EP-0073304-A1 A method of storing data in a storage device International Business Machines Corporation (US) 1983-03-09 — — EP claimed
US-RE28789-E ETHYLENICALLY UNSATURATED MONOMER; RADIATION ABSORBER E. I. DU PONT DE NEMOURS AND COMPANY (US) 1976-04-27 — — US claimed
WO-2026100662-A1 LIQUID CRYSTAL ALIGNING AGENT AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2026-05-15 — — WO disclosed
WO-2026100338-A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED RELIEF PATTERN 旭化成株式会社 2026-05-15 — — WO disclosed
WO-2026100508-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN 富士フイルム株式会社 2026-05-15 — — WO disclosed
US-12613465-B2 Photosensitive resin composition and method for producing cured relief pattern ASAHI KASEI KABUSHIKI KAISHA (JP) 2026-04-28 — — US disclosed
US-20260104641-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-16 — — US disclosed
US-4251619-A Process for forming photo-polymeric image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-02-17 — — US disclosed
US-4229514-A Photosensitive composition KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1980-10-21 — — US disclosed
US-4189323-A Radiation-sensitive copying composition HOECHST AKTIENGESELLSCHAFT (DE) 1980-02-19 — — US disclosed
US-4142898-A Imaging film of sensitizing layer upon UV-sensitive diazo layer ENERGY CONVERSION DEVICES, INC. (US) 1979-03-06 — — US disclosed
US-RE28789-E ETHYLENICALLY UNSATURATED MONOMER; RADIATION ABSORBER E. I. DU PONT DE NEMOURS AND COMPANY (US) 1976-04-27 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12613465-B2 Photosensitive resin composition and method for producing cured relief pattern ARCN1, GLRA1, PSMA1 MEN1 3372/4885KMT2A 483/4885MAPT 2839/4885
US-20260104641-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT ARCN1, PRDM9, LBR MEN1 4037/4885KMT2A 668/4885MAPT 1027/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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