Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 7/20 | 1.00 |
| ▸ | KMT2A | Q03164 | 7/20 | 1.00 |
| ▸ | MAPT | P10636 | 6/20 | 1.00 |
| ▸ | RAB9A | P51151 | 5/20 | 1.00 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 1.00 |
| ▸ | APP | P05067 | 3/20 | 1.00 |
| ▸ | INSR | P06213 | 2/20 | 1.00 |
| ▸ | NCOA1 | Q15788 | 1/20 | 1.00 |
| ▸ | NPC1 | O15118 | 2/20 | 0.73 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.73 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.73 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.73 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.73 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.73 |
| ▸ | KAT8 | Q9H7Z6 | 1/20 | 0.58 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.56 |
| ▸ | LMNA | P02545 | 2/20 | 0.56 |
| ▸ | ATP4A | P20648 | 8/20 | 0.55 |
| ▸ | ATP4B | P51164 | 8/20 | 0.55 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29413750 | 1.00 | MEN1 (1.00) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL29433017 | 1.00 | MEN1 (1.00) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL476579 | 1.00 | MEN1 (1.00) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| Iodide SCHEMBL8390905 | 0.99 | MEN1 (0.97) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| Iodide SCHEMBL8390903 | 0.99 | MEN1 (0.97) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| Bromide SCHEMBL8389954 | 0.99 | MEN1 (0.97) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| Bromide SCHEMBL8389953 | 0.99 | MEN1 (0.97) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL9841114 | 0.92 | MEN1 (0.84) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL31447671 | 0.92 | MEN1 (0.84) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 | |
| SCHEMBL29409733 | 0.92 | MEN1 (0.84) | MEN1KMT2AMAPTRAB9ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 399 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0721336-A1 | BENZAZOLE COMPOUNDS FOR USE IN THERAPY | CANCER RESEARCH CAMPAIGN TECHNOLOGY LIMITED (GB) | 1996-07-17 | — | — | EP | claimed |
| WO-1995006469-A1 | BENZAZOLE COMPOUNDS FOR USE IN THERAPY | CANCER RESEARCH CAMPAIGN TECHNOLOGY LIMITED (GB) | 1995-03-09 | — | — | WO | claimed |
| US-4985470-A | Three component photoinitiator system, printing plates, photoresists, inks, paints, adhesives | MITSUBISHI KASEI CORPORATION (JP) | 1991-01-15 | — | — | US | claimed |
| EP-0073304-B1 | A METHOD OF STORING DATA IN A STORAGE DEVICE | International Business Machines Corporation (US) | 1986-02-12 | — | — | EP | claimed |
| US-4538252-A | Light induced capacitance changes in donor polymers (or small molecules) films and its use for information storage in video disks and the like | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1985-08-27 | — | — | US | claimed |
| EP-0073304-A1 | A method of storing data in a storage device | International Business Machines Corporation (US) | 1983-03-09 | — | — | EP | claimed |
| US-RE28789-E | ETHYLENICALLY UNSATURATED MONOMER; RADIATION ABSORBER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-04-27 | — | — | US | claimed |
| WO-2026100338-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED RELIEF PATTERN | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100662-A1 | LIQUID CRYSTAL ALIGNING AGENT AND LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100508-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN | 富士フイルム株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| US-20260099093-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-09 | — | — | US | disclosed |
| EP-0107792-A1 | Photopolymerizable compositions | MITSUBISHI KASEI CORPORATION (JP) | 1984-05-09 | — | — | EP | disclosed |
| US-4442196-A | ADDITION POLYMER HAVING SOME AZIDO-CINNAMYLIDENE-ALPHA-CYANOACETATE GROUPS | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1984-04-10 | — | — | US | disclosed |
| EP-0073304-A1 | A method of storing data in a storage device | International Business Machines Corporation (US) | 1983-03-09 | — | — | EP | disclosed |
| US-4251619-A | Process for forming photo-polymeric image | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1981-02-17 | — | — | US | disclosed |
| US-4229514-A | Photosensitive composition | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1980-10-21 | — | — | US | disclosed |
| US-4189323-A | Radiation-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-02-19 | — | — | US | disclosed |
| US-RE28789-E | ETHYLENICALLY UNSATURATED MONOMER; RADIATION ABSORBER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-04-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ARCN1, GLRA1, PSMA1 | MEN1 3372/4885KMT2A 483/4885MAPT 2839/4885 |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | MEN1 4037/4885KMT2A 668/4885MAPT 1027/4885 |
| US-20260099093-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME | CD79B, ITGA1, PTK2 | MEN1 2775/4885KMT2A 373/4885MAPT 1037/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.