SCHEMBL29436330

SCHEMBL29436330

Cc1ccc(S(=O)(=O)N2C(=O)c3ccccc3C2=O)cc1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.65
VDR P11473 1/20 0.57
P2RX4 Q99571 1/20 0.56
CTSG P08311 1/20 0.54
CMA1 P23946 1/20 0.54
CA1 P00915 1/20 0.53
CA2 P00918 1/20 0.53
KCNN4 O15554 1/20 0.53
KCNA3 P22001 1/20 0.53
ELANE P08246 1/20 0.51
PRTN3 P24158 1/20 0.51
MMP2 P08253 2/20 0.50
GAA P10253 2/20 0.50
MAPT P10636 2/20 0.50
HTT P42858 1/20 0.50
LMNA P02545 2/20 0.49
NPSR1 Q6W5P4 1/20 0.49
ALDH1A1 P00352 3/20 0.49
SMN1; SMN2 Q16637 1/20 0.49
USP2 O75604 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1412652 1.00 L3MBTL1 (0.65) L3MBTL1VDRP2RX4CTSGCMA1
Phthalic Acid SCHEMBL28413887 0.87 L3MBTL1 (0.57) L3MBTL1VDRP2RX4CTSGCMA1
SCHEMBL11424876 0.86 PARL (0.59) L3MBTL1CTSGCMA1CA1CA2
SCHEMBL29172142 0.84 L3MBTL1 (0.65) L3MBTL1VDRP2RX4CTSGCMA1
SCHEMBL11397034 0.83 CTSG (0.53) L3MBTL1CTSGCMA1KCNN4KCNA3
SCHEMBL11403820 0.82 L3MBTL1 (0.51) L3MBTL1P2RX4CTSGCMA1CA1
SCHEMBL31107508 0.81 L3MBTL1 (0.60) L3MBTL1VDRP2RX4CTSGCMA1
SCHEMBL5176702 0.76 CA1 (0.56) L3MBTL1P2RX4CTSGCMA1CA1
SCHEMBL11393523 0.76 CTSG (0.53) L3MBTL1VDRCTSGCMA1MAPT
SCHEMBL28674968 0.75 KCNN4 (0.58) L3MBTL1VDRCTSGCMA1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024258088-A1 HOLOGRAM RECORDING MEDIUM, METHOD FOR MANUFACTURING SAME, AND OPTICAL ELEMENT COMPRISING SAME 주식회사 엘지화학 2024-12-19 WO disclosed
US-11427656-B2 Photosensitive composition for hologram recording, hologram recording medium, and hologram SONY CORPORATION (JP) 2022-08-30 US disclosed
EP-3508924-B1 PHOTOSENSITIVE COMPOSITION FOR HOLOGRAM RECORDING, HOLOGRAM RECORDING MEDIUM, AND HOLOGRAM SONY GROUP CORP (JP) 2022-05-04 EP disclosed
WO-2022055315-A1 HOLOGRAPHIC OPTICAL ELEMENT AND METHOD FOR MANUFACTURING SAME 주식회사 엘지화학 2022-03-17 WO disclosed