Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | CA1 | P00915 | 3/20 | 0.39 |
| ▸ | CA2 | P00918 | 3/20 | 0.39 |
| ▸ | CA4 | P22748 | 2/20 | 0.39 |
| ▸ | CA6 | P23280 | 2/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.39 |
| ▸ | PLCG1 | P19174 | 1/20 | 0.37 |
| ▸ | CA5A | P35218 | 2/20 | 0.36 |
| ▸ | CA9 | Q16790 | 2/20 | 0.36 |
| ▸ | HTR6 | P50406 | 6/20 | 0.36 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.34 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.34 |
| ▸ | SLC22A12 | Q96S37 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4930571 | 0.87 | HTR6 (0.53) | GAAKMT2AHSD11B1HTR6 | |
| SCHEMBL7760171 | 0.83 | GAA (0.34) | GAAMEN1KMT2AHSD11B1 | |
| SCHEMBL5677667 | 0.82 | HTR6 (0.39) | GAAMEN1KMT2ACA1CA2 | |
| SCHEMBL3136914 | 0.81 | MYC (0.41) | GAAMEN1KMT2ACA1CA2 | |
| SCHEMBL9360088 | 0.80 | HSD11B1 (0.54) | GAAMEN1KMT2ACA2HSD11B1 | |
| SCHEMBL8178997 | 0.79 | HSD11B1 (0.32) | GAAHSD11B1 | |
| SCHEMBL3625928 | 0.78 | MEN1 (0.60) | GAAMEN1KMT2AHSD11B1HTR6 | |
| SCHEMBL544877 | 0.78 | GAA (0.44) | GAAMEN1KMT2ACA1CA2 | |
| SCHEMBL29874131 | 0.78 | MEN1 (0.60) | GAAMEN1KMT2AHSD11B1HTR6 | |
| SCHEMBL10406025 | 0.78 | KMT2A (0.36) | GAAMEN1KMT2ACA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1308 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4067998-B1 | EO/PO MODIFIED 9-PHENYLACRIDINE PHOTOSENSITIZERS FOR USE IN PHOTOSENSITIVE RESINS IN THE MANUFACTURE OF PRINTED CIRCUIT BOARDS | CHANGZHOU TRONLY NEW ELECTRONIC MAT CO LTD (CN) | 2025-11-12 | — | — | EP | claimed |
| CN-119930901-A | Resin, initiator combination and coating for preparing photosensitive film | 珦盛新材料(珠海)有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119668028-A | Negative photoresist composition, application thereof and imaging method | 福建泓光半导体材料有限公司 | 2025-03-21 | — | — | CN | claimed |
| CN-118732392-A | Photoresist composition and preparation method thereof | 万华化学集团股份有限公司 | 2024-10-01 | — | — | CN | claimed |
| CN-116339074-B | Photosensitive composition containing modified 9-phenylacridine photoinitiator | 湖南五江高科技材料有限公司 | 2024-07-26 | — | — | CN | claimed |
| CN-118295208-A | Chemical amplification type photoresist and preparation method and application thereof | 万华化学集团股份有限公司 | 2024-07-05 | — | — | CN | claimed |
| CN-116589622-A | High-temperature-resistant photoresist film-forming resin and preparation method and application thereof | 北京化工大学 | 2023-08-15 | — | — | CN | claimed |
| CN-116339074-A | Photosensitive composition containing modified 9-phenylacridine photoinitiator | 湖南五江高科技材料有限公司 | 2023-06-27 | — | — | CN | claimed |
| WO-2023074629-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, AND LAMINATE PRODUCTION METHOD | 株式会社レゾナック | 2023-05-04 | — | — | WO | claimed |
| CN-116003702-A | 3D printing resin and application | 深圳市纵维立方科技有限公司 | 2023-04-25 | — | — | CN | claimed |
| EP-0566353-A1 | Photopolymerizable composition | MITSUBISHI RAYON COMPANY LTD. (JP) | 1993-10-20 | — | — | EP | claimed |
| EP-0243784-B1 | PHOTOPOLIMERIZABLE COMPOSITION AND PHOTOPOLYMERIZABLE IMAGING MATERIAL CONTAINING IT | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-07-29 | — | — | EP | claimed |
| US-5057398-A | Improved photosensitivity | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-10-15 | — | — | US | claimed |
| EP-0170492-B1 | THERMOSENSITIVE RECORDING METHOD | SHARP KABUSHIKI KAISHA (JP) | 1990-12-27 | — | — | EP | claimed |
| US-4876177-A | Process for producing printed circuit board | HITACHI, LTD. (JP) | 1989-10-24 | — | — | US | claimed |
| US-4824822-A | Thermosensitive recording material | SHARP KABUSHIKI KAISHA (JP) | 1989-04-25 | — | — | US | claimed |
| US-4794069-A | Spirobenzanthracene phthalide compounds, processes for preparing same and color forming recording materials containing said compounds | SHIN NISSO KAKO CO., LTD. (JP) | 1988-12-27 | — | — | US | claimed |
| EP-0071789-B1 | Photopolymerisable transfer material suitable for the production of photoresist layers | BASF Aktiengesellschaft (DE) | 1986-06-04 | — | — | EP | claimed |
| US-4293630-A | Electrophotographic photosensitive member | RANK XEROX LIMITED (GB) | 1981-10-06 | — | — | US | claimed |
| US-4251619-A | Process for forming photo-polymeric image | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1981-02-17 | — | — | US | claimed |