SCHEMBL29464240

SCHEMBL29464240

C=COc1cc(C)ccc1C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.41
HPGD P15428 2/20 0.41
TSHR P16473 2/20 0.41
CYP2C9 P11712 2/20 0.39
LMNA P02545 1/20 0.39
HTT P42858 1/20 0.39
TDP1 Q9NUW8 5/20 0.38
ALDH1A1 P00352 2/20 0.38
SMN1; SMN2 Q16637 3/20 0.37
KMT2A Q03164 1/20 0.37
TTR P02766 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2C8 P10632 1/20 0.36
CHRM1 P11229 1/20 0.36
ADRA1A P35348 1/20 0.36
PPARG P37231 1/20 0.36
HTR2B P41595 1/20 0.36
PPARA Q07869 1/20 0.36
SLCO1B3 Q9NPD5 1/20 0.36
CISD1 Q9NZ45 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17063055 1.00 ACHE (0.41) ACHEHPGDTSHRCYP2C9LMNA
SCHEMBL29591261 0.83 ACHE (0.41) ACHEHPGDTSHRLMNATDP1
SCHEMBL7766990 0.83 ACHE (0.41) ACHEHPGDTSHRLMNATDP1
SCHEMBL5611765 0.81 CYP1A1 (0.31) ACHETDP1CYP1A2CA1CA2
SCHEMBL5544557 0.79 CYP3A4 (0.46) ACHETSHRTDP1ALDH1A1SMN1; SMN2
SCHEMBL21741514 0.79 ACHE (0.65) ACHEHPGDTSHRCYP2C9LMNA
SCHEMBL10289790 0.79 ACHE (0.39) ACHEHPGDLMNATDP1ALDH1A1
SCHEMBL8332919 0.79 CYP3A4 (0.42) TSHRLMNAALDH1A1CYP1A2HTR2B
SCHEMBL97154 0.78 TSHR (0.44) ACHEHPGDTSHRCYP2C9LMNA
SCHEMBL4417781 0.76 ACHE (0.48) ACHELMNAHTTALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117999296-A Composition and photosensitive composition 东京应化工业株式会社 2024-05-07 CN disclosed
CN-117980346-A Composition and photosensitive composition 东京应化工业株式会社 2024-05-03 CN disclosed
CN-117908327-A Composition and photosensitive composition 东京应化工业株式会社 2024-04-19 CN disclosed
CN-117908326-A Photosensitive composition 东京应化工业株式会社 2024-04-19 CN disclosed
CN-108957956-B Curable composition, cured product, cured film, display panel, and method for producing cured product 东京应化工业株式会社 2024-04-02 CN disclosed
CN-117178001-A Photocurable composition 东京应化工业株式会社 2023-12-05 CN disclosed
CN-116515023-A Composition and cured product 东京应化工业株式会社 2023-08-01 CN disclosed
CN-114502613-A Curable composition, cured product, and method for forming cured product 东京应化工业株式会社 2022-05-13 CN disclosed
CN-114437624-A Polyimide varnish, method for producing polyimide film, and method for producing patterned polyimide film 东京应化工业株式会社 2022-05-06 CN disclosed
US-11267932-B2 Curable composition, cured film, display panel or OLED light, and method for producing cured product TOKYO OHKA KOGYO CO., LTD. (JP) 2022-03-08 US disclosed