SCHEMBL29467883

SCHEMBL29467883

Nc1ccc(Oc2ccc(-c3ccc(Oc4ccc(N)cc4C(F)(F)F)c(C(=O)O)c3)cc2C(=O)O)c(C(F)(F)F)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 4/20 0.46
CFD P00746 1/20 0.44
KDM4E B2RXH2 4/20 0.42
KMT2A Q03164 3/20 0.42
GFER P55789 1/20 0.42
RXFP1 Q9HBX9 1/20 0.42
MCL1 Q07820 2/20 0.41
ALDH1A1 P00352 5/20 0.41
POLB P06746 3/20 0.40
GAA P10253 3/20 0.40
GLA P06280 1/20 0.40
TSHR P16473 1/20 0.40
SCN9A Q15858 1/20 0.40
RXRA P19793 2/20 0.40
RXRB P28702 2/20 0.40
RXRG P48443 2/20 0.40
NR1I2 O75469 1/20 0.39
CYP2C8 P10632 1/20 0.39
KIF11 P52732 1/20 0.39
MAPT P10636 3/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29467879 1.00 IDO1 (0.46) IDO1CFDKDM4EKMT2AGFER
SCHEMBL28289301 0.86 HTT (0.48) IDO1KDM4EALDH1A1POLBGAA
SCHEMBL30835355 0.81 RXRA (0.46) KDM4EALDH1A1POLBGAAGLA
SCHEMBL28284468 0.80 PTGS1 (0.40) IDO1KDM4EKMT2AMCL1ALDH1A1
SCHEMBL29404322 0.80 GAA (0.59) KDM4EKMT2AALDH1A1POLBGAA
SCHEMBL436804 0.80 GAA (0.59) KDM4EKMT2AALDH1A1POLBGAA
SCHEMBL29467849 0.79 CYP1A2 (0.50) IDO1CFDKMT2AALDH1A1MAPT
Hydrochloric Acid SCHEMBL8863493 0.78 GAA (0.57) IDO1KDM4EKMT2AALDH1A1POLB
SCHEMBL711924 0.78 KDM4E (0.59) CFDKDM4EKMT2AGFERRXFP1
SCHEMBL27907200 0.77 ELANE (0.44) KMT2AALDH1A1POLBGAAGLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114106326-A Photosensitive resin, photoresist and preparation method and application thereof 广东粤港澳大湾区黄埔材料研究院 2022-03-01 CN claimed
CN-114106326-A Photosensitive resin, photoresist and preparation method and application thereof 广东粤港澳大湾区黄埔材料研究院 2022-03-01 CN disclosed