SCHEMBL29481122

SCHEMBL29481122

S=C(Nc1cccc(Cl)c1)Nc1cccc(Cl)c1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 1/20 0.79
MEN1 O00255 2/20 0.77
ALDH1A1 P00352 2/20 0.77
KMT2A Q03164 2/20 0.77
MAOA P21397 1/20 0.77
MAOB P27338 1/20 0.77
CYP1A2 P05177 1/20 0.72
CYP3A4 P08684 1/20 0.72
CYP2D6 P10635 1/20 0.72
MAPT P10636 1/20 0.72
CYP2C19 P33261 1/20 0.72
SMN1; SMN2 Q16637 1/20 0.72
GAA P10253 1/20 0.71

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26991 1.00 IDO1 (0.79) IDO1MEN1ALDH1A1KMT2AMAOA
SCHEMBL5454961 0.94 MAOB (0.75) IDO1MEN1ALDH1A1KMT2AMAOA
SCHEMBL11067896 0.92 ALDH1A1 (0.78) IDO1MEN1ALDH1A1KMT2AMAOA
SCHEMBL22274845 0.92 IDO1 (0.73) IDO1MEN1ALDH1A1KMT2AMAOA
SCHEMBL16566480 0.89 MEN1 (0.80) IDO1MEN1ALDH1A1KMT2AMAOA
SCHEMBL16566494 0.89 ALDH1A1 (0.71) IDO1MEN1ALDH1A1KMT2AMAOA
SCHEMBL16566471 0.89 IDO1 (0.65) IDO1MEN1ALDH1A1KMT2AMAOA
SCHEMBL5437433 0.88 IDO1 (1.00) IDO1MEN1ALDH1A1KMT2AMAOA
SCHEMBL16566455 0.88 MAOB (1.00) IDO1MEN1ALDH1A1KMT2AMAOA
SCHEMBL6811430 0.88 MEN1 (0.71) IDO1MEN1ALDH1A1KMT2AMAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12466196-B2 Drawing system and drawing method Sony Group Corporation (JP) 2025-11-11 US disclosed
CN-119707777-A Synthesis method of asymmetric thiourea compound 浙江工业大学 2025-03-28 CN disclosed
WO-2025053270-A1 DRAWING SYSTEM ソニーグループ株式会社 2025-03-13 WO disclosed
WO-2025052861-A1 DRAWING METHOD AND DRAWING SYSTEM ソニーグループ株式会社 2025-03-13 WO disclosed
US-20240165983-A1 DRAWING SYSTEM AND DRAWING METHOD Sony Group Corporation (JP) 2024-05-23 US disclosed
CN-117042976-A Drawing system and drawing method 索尼集团公司 2023-11-10 CN disclosed
CN-113260516-B Thermosensitive recording medium 株式会社理光 2023-05-02 CN disclosed
CN-112638653-B Drawing method, thermosensitive recording medium, and drawing apparatus 索尼公司 2023-02-17 CN disclosed
CN-111511563-B Drawing method, erasing method, and drawing apparatus 索尼公司 2023-01-10 CN disclosed
CN-111511567-B Drawing method and erasing method 索尼公司 2022-12-20 CN disclosed
CN-111278657-B Thermosensitive recording medium and exterior member 索尼公司 2022-12-20 CN disclosed
CN-112334318-B Reversible recording medium and exterior member 索尼公司 2022-12-20 CN disclosed
CN-112368154-B Drawing and erasing apparatus and erasing method 索尼公司 2022-09-13 CN disclosed
CN-111465504-B Reversible recording medium and exterior member 索尼公司 2022-04-15 CN disclosed