⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4368259 | 0.84 | — | — | |
| SCHEMBL4429201 | 0.83 | — | — | |
| SCHEMBL4430804 | 0.81 | CES2 (0.40) | — | |
| SCHEMBL9932517 | 0.80 | — | — | |
| SCHEMBL14939281 | 0.79 | CES2 (0.43) | — | |
| SCHEMBL4427588 | 0.79 | CES2 (0.43) | — | |
| SCHEMBL4429063 | 0.79 | CES2 (0.43) | — | |
| SCHEMBL4432502 | 0.79 | CES2 (0.43) | — | |
| SCHEMBL5077032 | 0.79 | CES2 (0.43) | — | |
| SCHEMBL4437405 | 0.79 | CES2 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113966281-A | Pneumatic tire | 住友橡胶工业株式会社 | 2022-01-21 | — | — | CN | disclosed |
| EP-1683782-B1 | Chiral copper complex and production processes thereof and using the same | SUMITOMO CHEMICAL CO (JP) | 2012-03-14 | — | — | EP | disclosed |
| EP-1683783-B1 | Chiral copper complex and production processes thereof and using the same | SUMITOMO CHEMICAL CO (JP) | 2012-03-14 | — | — | EP | disclosed |
| EP-1253135-B1 | Asymmetric copper complex and cyclopropanation reaction using the same | SUMITOMO CHEMICAL CO (JP) | 2010-11-24 | — | — | EP | disclosed |
| EP-2091928-A2 | 3-(2-ACYLAMINO-1-HYDROXYETHYL)- MORPHOLINE DERIVATIVES AND THEIR USE AS BACE INHIBITORS | ELI LILLY AND COMPANY (US) | 2009-08-26 | — | — | EP | disclosed |
| US-7544461-B2 | Near infrared ray activation type positive resin composition | KANSAI PAINT CO., LTD. (JP) | 2009-06-09 | — | — | US | disclosed |
| EP-1120402-B1 | Chiral copper complex and production processes thereof and using the same | SUMITOMO CHEMICAL CO (JP) | 2008-06-25 | — | — | EP | disclosed |
| US-7358030-B2 | Process for producing ether compound | KYOWA YUKA CO., LTD. (JP) | 2008-04-15 | — | — | US | disclosed |
| US-20070259279-A1 | Near Infrared Ray Activation Type Positive Resin Composition | KANSAI PAINT CO., LTD. (JP) | 2007-11-08 | — | — | US | disclosed |
| EP-1788432-A1 | POSITIVE RESIN COMPOSITION OF NEAR-INFRARED-RAY ACTIVATION TYPE | Kansai Paint Co., Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
| US-20040181097-A1 | Process for producing ether compound | KYOWA YUKA CO., LTD. (JP) | 2004-09-16 | — | — | US | disclosed |
| EP-1415968-A1 | PROCESS FOR PRODUCING ETHER COMPOUND | Kyowa Yuka Co., Ltd. (JP) | 2004-05-06 | — | — | EP | disclosed |
| US-6670500-B2 | Chiral copper complex and production processes thereof and using the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-12-30 | — | — | US | disclosed |
| US-20020177718-A1 | Asymmetric copper complex and cyclopropanation reaction using the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-11-28 | — | — | US | disclosed |
| EP-1253135-A1 | Asymmetric copper complex and cyclopropanation reaction using the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-10-30 | — | — | EP | disclosed |
| US-6469198-B2 | OBTAINED BY CONTACTING N-SALICYLIDENEAMINOALCOHOL WITH MONO OR DIVALENT COPPER COMPOUND; FORMATION OF OPTICALLY ACTIVE CYCLOPROPANE-CARBOXYLIC ESTER FROM PROCHIRAL OLEFIN AND DIAZOACETIC ACID ESTER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-10-22 | — | — | US | disclosed |
| US-20020004618-A1 | Chiral copper complex and production processes thereof and using the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-10 | — | — | US | disclosed |
| US-20010037036-A1 | Chiral copper complex catalyst composition and asymmetric production process using the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-01 | — | — | US | disclosed |
| EP-1120402-A2 | Chiral copper complex and production processes thereof and using the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-01 | — | — | EP | disclosed |
| EP-1120401-A2 | Chiral copper complex catalyst composition and asymmetric production process using the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-01 | — | — | EP | disclosed |