Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TNKS | O95271 | 2/20 | 0.56 |
| ▸ | TNKS2 | Q9H2K2 | 2/20 | 0.56 |
| ▸ | TP53 | P04637 | 3/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.52 |
| ▸ | ESR1 | P03372 | 4/20 | 0.51 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.51 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.50 |
| ▸ | TNF | P01375 | 1/20 | 0.50 |
| ▸ | NOD1 | Q9Y239 | 1/20 | 0.50 |
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | RAB9A | P51151 | 1/20 | 0.48 |
| ▸ | CNR1 | P21554 | 1/20 | 0.46 |
| ▸ | CNR2 | P34972 | 1/20 | 0.46 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.46 |
| ▸ | ATM | Q13315 | 1/20 | 0.46 |
| ▸ | AKT1 | P31749 | 1/20 | 0.45 |
| ▸ | AKT2 | P31751 | 1/20 | 0.45 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL601648 | 1.00 | TNKS (0.56) | TNKSTNKS2TP53SMN1; SMN2ESR1 | |
| SCHEMBL14278928 | 0.87 | ESR1 (0.53) | TNKSTNKS2TP53SMN1; SMN2ESR1 | |
| SCHEMBL28364734 | 0.86 | ESR1 (0.58) | TNKSTNKS2TP53SMN1; SMN2ESR1 | |
| SCHEMBL30662421 | 0.84 | TNKS (0.46) | TNKSTNKS2TP53SMN1; SMN2HDAC6 | |
| SCHEMBL22978415 | 0.84 | TNKS (0.46) | TNKSTNKS2TP53SMN1; SMN2HDAC6 | |
| SCHEMBL5955995 | 0.84 | KIF11 (0.46) | TNKSTNKS2TP53SMN1; SMN2HDAC6 | |
| SCHEMBL30956247 | 0.84 | ESR1 (0.50) | TNKSTNKS2TP53SMN1; SMN2ESR1 | |
| SCHEMBL29274260 | 0.84 | ESR1 (0.50) | TNKSTNKS2TP53SMN1; SMN2ESR1 | |
| SCHEMBL600986 | 0.81 | ABCG2 (0.53) | TNKSTNKS2TP53SMN1; SMN2ESR1 | |
| SCHEMBL29488281 | 0.81 | ABCG2 (0.53) | TNKSTNKS2TP53SMN1; SMN2ESR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-120044756-A | Photosensitive resin composition | 旭化成株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-115524922-B | Photosensitive resin composition | 旭化成株式会社 | 2025-02-18 | — | — | CN | disclosed |
| CN-118119565-A | Structure having micro-channel, method for manufacturing same, and micro-channel device | 旭化成株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-116981999-A | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2023-10-31 | — | — | CN | disclosed |
| CN-111315828-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-09-29 | — | — | CN | disclosed |
| CN-112154167-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-08-22 | — | — | CN | disclosed |
| CN-111527450-B | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2023-08-08 | — | — | CN | disclosed |
| CN-111596526-B | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2023-07-25 | — | — | CN | disclosed |
| CN-116348294-A | Photosensitive resin laminate | 旭化成株式会社 | 2023-06-27 | — | — | CN | disclosed |
| WO-2023068276-A1 | STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE | 旭化成株式会社 | 2023-04-27 | — | — | WO | disclosed |
| CN-115524922-A | Photosensitive resin composition | 旭化成株式会社 | 2022-12-27 | — | — | CN | disclosed |
| CN-110325913-B | Photosensitive resin composition | 旭化成株式会社 | 2022-11-01 | — | — | CN | disclosed |
| CN-115047714-A | Resist composition and laminate thereof | 杭州福斯特电子材料有限公司 | 2022-09-13 | — | — | CN | disclosed |
| WO-2022186389-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME | 旭化成株式会社 | 2022-09-09 | — | — | WO | disclosed |
| CN-114667487-A | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2022-06-24 | — | — | CN | disclosed |
| CN-110114376-B | Curable composition, method for producing cured product, cured product thereof, and adhesive using same | 株式会社ADEKA | 2022-06-14 | — | — | CN | disclosed |
| WO-2022085366-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY | 旭化成株式会社 | 2022-04-28 | — | — | WO | disclosed |
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | disclosed |
| CN-114296315-A | Photosensitive resin composition | 旭化成株式会社 | 2022-04-08 | — | — | CN | disclosed |