SCHEMBL601648

SCHEMBL601648

CC(C)(C)c1ccc(-c2c3ccccc3nc3ccccc23)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TNKS O95271 2/20 0.56
TNKS2 Q9H2K2 2/20 0.56
TP53 P04637 3/20 0.52
SMN1; SMN2 Q16637 3/20 0.52
ESR1 P03372 4/20 0.51
ESR2 Q92731 3/20 0.51
HDAC6 Q9UBN7 1/20 0.50
TNF P01375 1/20 0.50
NOD1 Q9Y239 1/20 0.50
ABCG2 Q9UNQ0 1/20 0.50
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
RAB9A P51151 1/20 0.48
CNR1 P21554 1/20 0.46
CNR2 P34972 1/20 0.46
GPR55 Q9Y2T6 1/20 0.46
ATM Q13315 1/20 0.46
AKT1 P31749 1/20 0.45
AKT2 P31751 1/20 0.45
GPR84 Q9NQS5 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29488291 1.00 TNKS (0.56) TNKSTNKS2TP53SMN1; SMN2ESR1
SCHEMBL14278928 0.87 ESR1 (0.53) TNKSTNKS2TP53SMN1; SMN2ESR1
SCHEMBL28364734 0.86 ESR1 (0.58) TNKSTNKS2TP53SMN1; SMN2ESR1
SCHEMBL30662421 0.84 TNKS (0.46) TNKSTNKS2TP53SMN1; SMN2HDAC6
SCHEMBL22978415 0.84 TNKS (0.46) TNKSTNKS2TP53SMN1; SMN2HDAC6
SCHEMBL5955995 0.84 KIF11 (0.46) TNKSTNKS2TP53SMN1; SMN2HDAC6
SCHEMBL30956247 0.84 ESR1 (0.50) TNKSTNKS2TP53SMN1; SMN2ESR1
SCHEMBL29274260 0.84 ESR1 (0.50) TNKSTNKS2TP53SMN1; SMN2ESR1
SCHEMBL600986 0.81 ABCG2 (0.53) TNKSTNKS2TP53SMN1; SMN2ESR1
SCHEMBL29488281 0.81 ABCG2 (0.53) TNKSTNKS2TP53SMN1; SMN2ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110357989-B Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition 常州强力电子新材料股份有限公司 2022-04-22 CN claimed
CN-108241259-B Resist composition with good hole masking function and capable of directly depicting, exposing and imaging 杭州福斯特电子材料有限公司 2021-08-10 CN claimed
CN-110357989-A Tertiary amine photosensitizer, preparation method, comprising its photosensitive polymer combination and photosensitive polymer combination application 常州强力电子新材料股份有限公司 2019-10-22 CN claimed
CN-109976095-A It is a kind of directly to describe the anti-corrosion agent composition and layered product being imaged by light 杭州福斯特应用材料股份有限公司 2019-07-05 CN claimed
CN-108241259-A A kind of anti-corrosion agent composition that can directly describe exposure image with good hole masking function 浙江福斯特新材料研究院有限公司 2018-07-03 CN claimed
US-5346805-A Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US claimed
US-4587200-A Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1986-05-06 US claimed
US-12353130-B2 Photosensitive resin composition and photosensitive resin multilayer body ASAHI KASEI KABUSHIKI KAISHA (JP) 2025-07-08 US disclosed
WO-2025018412-A1 PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CONDUCTOR PATTERN 旭化成株式会社 2025-01-23 WO disclosed
US-20240408595-A1 STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-12-12 US disclosed
US-12032286-B2 Method for producing multi-layered type microchannel device using photosensitive resin laminate ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-07-09 US disclosed
CN-118119565-A Structure having micro-channel, method for manufacturing same, and micro-channel device 旭化成株式会社 2024-05-31 CN disclosed
US-20240059803-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-02-22 US disclosed
EP-0311926-B1 Photopolymerisable composition MORTON INT INC (US) 1996-03-20 EP disclosed
EP-0363775-B1 Stabilisation process of a leuco dye solution, and mixture, polymerizable by radiation, containing a leuco dye MORTON INT INC (US) 1995-09-13 EP disclosed
US-5346805-A Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US disclosed
US-5085669-A Against oxidation in air HOECHST AKTIENGESELLSCHAFT (DE) 1992-02-04 US disclosed
US-4940647-A Photopolymerizable compositions a leuco dye and a leuco dye stabilizer HOECHST AKTIENGESELLSCHAFT (DE) 1990-07-10 US disclosed
EP-0311926-A2 Photopolymerisable composition MORTON INTERNATIONAL, INC. (US) 1989-04-19 EP disclosed
US-4587200-A Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1986-05-06 US disclosed