SCHEMBL2950109

SCHEMBL2950109

CCCO[Si](CCc1ccc(CCl)cc1)(OCCC)OCCC

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
ALDH1A1 P00352 2/20 0.31
RAB9A P51151 1/20 0.31
ACACB O00763 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL926943 0.90 ALDH1A1 (0.37) LMNAALDH1A1
SCHEMBL2952451 0.90 THRA (0.34) LMNAALDH1A1
SCHEMBL3029605 0.88 THRA (0.36) LMNAALDH1A1
SCHEMBL926928 0.85 CYP4F2 (0.33)
SCHEMBL25366983 0.84 CYP4F2 (0.32)
SCHEMBL2951754 0.83 TSHR (0.33)
SCHEMBL15736606 0.82 HPGD (0.41) L3MBTL1ALDH1A1
SCHEMBL2955367 0.82 LMNA (0.33) LMNAL3MBTL1ALDH1A1ACACB
SCHEMBL16669200 0.82 ESR1 (0.47) LMNAL3MBTL1ALDH1A1
SCHEMBL17529817 0.81 CSNK2A1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759406-B2 Process for producing polysilsesquioxane graft polymer, pressure-sensitive adhesive, and pressure-sensitive adhesive sheet LINTEC CORPORATION (JP) 2010-07-20 US disclosed
US-20080051487-A1 Process for Producing Polysilsesquioxane Graft Polymer, Pressure-Sensitive Adhesive, and Pressure-Sensitive Adhesive Sheet LINTEC CORPORATION (JP) 2008-02-28 US disclosed