SCHEMBL295172

SCHEMBL295172

CC=CCC=Cc1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 4/20 0.50
IDO1 P14902 2/20 0.48
PAM P19021 1/20 0.48
MAOB P27338 1/20 0.46
RELA Q04206 1/20 0.45
NFE2L2 Q16236 1/20 0.44
SIGMAR1 Q99720 3/20 0.44
GRM5 P41594 1/20 0.44
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43
HTR2C P28335 1/20 0.42
HTR2B P41595 1/20 0.42
CHAT P28329 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21457936 1.00 HTR2A (0.50) HTR2AIDO1PAMMAOBRELA
SCHEMBL21457935 1.00 HTR2A (0.50) HTR2AIDO1PAMMAOBRELA
SCHEMBL4863423 0.87 IDO1 (0.58) HTR2AIDO1PAMMAOBRELA
SCHEMBL9777486 0.87 IDO1 (0.58) HTR2AIDO1PAMMAOBRELA
SCHEMBL631965 0.85 MAOB (0.46) HTR2AIDO1PAMMAOBRELA
SCHEMBL5563497 0.83 HTR2A (0.52) HTR2AIDO1PAMMAOBRELA
SCHEMBL5563494 0.83 HTR2A (0.52) HTR2AIDO1PAMMAOBRELA
SCHEMBL6688225 0.80 SIGMAR1 (0.49) HTR2AIDO1PAMMAOBSIGMAR1
SCHEMBL29838560 0.79 NFE2L2 (0.52) RELANFE2L2KMT2A
SCHEMBL6158362 0.78 ALDH1A1 (0.42) HTR2AIDO1PAMMAOBRELA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2032 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4367184-A1 POLYCARBONATE COMPOSITIONS HAVING IMPROVED IMPACT PROPERTIES SHPP Global Technologies B.V. (NL) 2024-05-15 EP claimed
CN-117980405-A Polycarbonate compositions with improved impact properties 高新特殊工程塑料全球技术有限公司 2024-05-03 CN claimed
EP-3751644-B1 SECONDARY BATTERY HAVING IMPROVED HIGH-TEMPERATURE PROPERTIES SK ON CO LTD (KR) 2024-04-17 EP claimed
CN-117843237-A Zirconium-containing high-lead glass frit, preparation method and silver paste 杭州正银电子材料有限公司 2024-04-09 CN claimed
US-20240034875-A1 Thermoplastic Compositions With Low Dissipation Factor For Nano Molding Technology (NMT) Applications SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2024-02-01 US claimed
US-20240006589-A1 SECONDARY BATTERY HAVING IMPROVED HIGH-TEMPERATURE PROPERTIES SK ON CO LTD (KR) 2024-01-04 US claimed
US-20230392004-A1 Laser Direct Structuring Compositions Including a Crystalline Polyester SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2023-12-07 US claimed
CN-116940608-A Curable composition AGC多材料美国有限公司 2023-10-24 CN claimed
CN-116829647-A Thermoplastic compositions with low dissipation factor for nano-molding technology (NMT) applications 高新特殊工程塑料全球技术有限公司 2023-09-29 CN claimed
US-20230303833-A1 Compositions and Articles of Wave Transmission and Improved Dimensional Radar Cover Material SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2023-09-28 US claimed
EP-0334075-B1 Rubber PELIKAN AG (DE) 1995-07-12 EP claimed
EP-0343853-B1 PROCESS FOR GENERATING TWO-COLOR IMAGES XEROX CORPORATION (US) 1993-09-08 EP claimed
EP-0324097-B1 EXTERNAL FEMININE PROTECTION DEVICE WITH SKID-RESISTANT COATING FOR HOLDING THE DEVICE IN PLACE KIMBERLY-CLARK CORPORATION (US) 1992-09-23 EP claimed
EP-0343853-A1 Process for generating two-color images XEROX CORPORATION (US) 1989-11-29 EP claimed
US-4877698-A Electrophotographic process for generating two-color images using liquid developer XEROX CORPORATION (US) 1989-10-31 US claimed
EP-0324097-A2 External feminine protection device with skid-resistant coating for holding the device in place KIMBERLY-CLARK CORPORATION (US) 1989-07-19 EP claimed
US-4834739-A External feminine protection device with skid-resistant coating for holding the device in place KIMBERLY-CLARK CORPORATION (US) 1989-05-30 US claimed
US-4592690-A Hot melt gasketing compositions and processes for applying them BONDED PRODUCTS, INC. (US) 1986-06-03 US claimed
EP-0021595-B1 SOLID STATE ION SELECTIVE ELECTRODES AND MEMBRANES BECKMAN INSTRUMENTS, INC. (US) 1984-10-17 EP claimed
US-4132037-A Apparatus for polishing semiconductor wafers SILTEC CORPORATION (US) 1979-01-02 US claimed