Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRP | O00591 | 1/20 | 0.38 |
| ▸ | GABRD | O14764 | 1/20 | 0.38 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.38 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.38 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.38 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.38 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.38 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.38 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.38 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.38 |
| ▸ | GABRA4 | P48169 | 1/20 | 0.38 |
| ▸ | GABRE | P78334 | 1/20 | 0.38 |
| ▸ | GABRA6 | Q16445 | 1/20 | 0.38 |
| ▸ | GABRG1 | Q8N1C3 | 1/20 | 0.38 |
| ▸ | GABRG3 | Q99928 | 1/20 | 0.38 |
| ▸ | GABRQ | Q9UN88 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL383662 | 0.81 | LMNA (0.48) | LMNACYP2C9 | |
| SCHEMBL14113500 | 0.77 | — | — | |
| SCHEMBL2951958 | 0.72 | GABRP (0.42) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL14509966 | 0.72 | GABRP (0.38) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL24634134 | 0.71 | LMNA (0.37) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL1902555 | 0.69 | LMNA (0.33) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL1448144 | 0.69 | — | — | |
| SCHEMBL13817660 | 0.67 | GABRP (0.38) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL21235010 | 0.67 | LMNA (0.34) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| SCHEMBL45972 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1096317-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2010-09-08 | — | — | EP | claimed |
| US-6737215-B2 | Photoresist composition for deep ultraviolet lithography | CLARIANT FINANCE (BVI) LTD (VG) | 2004-05-18 | — | — | US | claimed |
| EP-1392745-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | Clariant Finance (BVI) Limited (VG) | 2004-03-03 | — | — | EP | claimed |
| EP-1388027-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD. (CH) | 2004-02-11 | — | — | EP | claimed |
| US-6686429-B2 | COPOLYMER OF AN ETHENICALLY UNSATURATED NITRILE-CONTAINING MONOMER AND A NONAROMATIC CYCLIC UNIT SUCH AS TERT-BUTYL NORBORENECARBOXYLATE; SENSITIVE IN DEEP ULTRAVIOLET REGION; MICROLITHOGRAPHY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-02-03 | — | — | US | claimed |
| US-20030013831-A1 | NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-16 | — | — | US | claimed |
| US-20020187419-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-12 | — | — | US | claimed |
| WO-2002093263-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | claimed |
| WO-2002092651-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | claimed |
| EP-2192134-B1 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION, AND COMPOUND USED IN THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORP (JP) | 2014-02-26 | — | — | EP | disclosed |
| EP-1816519-B1 | Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition | FUJIFILM CORP (JP) | 2010-11-03 | — | — | EP | disclosed |
| EP-1392745-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | Clariant Finance (BVI) Limited (VG) | 2004-03-03 | — | — | EP | disclosed |
| EP-1388027-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD. (CH) | 2004-02-11 | — | — | EP | disclosed |
| US-6686429-B2 | COPOLYMER OF AN ETHENICALLY UNSATURATED NITRILE-CONTAINING MONOMER AND A NONAROMATIC CYCLIC UNIT SUCH AS TERT-BUTYL NORBORENECARBOXYLATE; SENSITIVE IN DEEP ULTRAVIOLET REGION; MICROLITHOGRAPHY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-02-03 | — | — | US | disclosed |
| US-20030013831-A1 | NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-16 | — | — | US | disclosed |
| US-20020187419-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-12 | — | — | US | disclosed |
| WO-2002093263-A1 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | disclosed |
| WO-2002092651-A1 | POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-11-21 | — | — | WO | disclosed |