SCHEMBL29520305

SCHEMBL29520305

CC(C)(C)CC(C)(C)OP(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10074902 0.82
SCHEMBL8227664 0.79
SCHEMBL13950863 0.75 CYP2D6 (0.39)
SCHEMBL1922094 0.74
SCHEMBL11723833 0.74
SCHEMBL12946107 0.73
SCHEMBL1921065 0.70 LMNA (0.31)
SCHEMBL14819123 0.69
SCHEMBL75111 0.67 ALDH1A1 (0.41)
SCHEMBL5077170 0.67 TSHR (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114253069-A Photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film 信越化学工业株式会社 2022-03-29 CN disclosed