SCHEMBL29530643

SCHEMBL29530643

C=C(C)C(=O)OC(CCCCC)CC[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C

nearest known ligand 0.39

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.39
PDCD4 Q53EL6 1/20 0.32
FAAH O00519 1/20 0.31
CNR1 P21554 1/20 0.31
DAGLA Q9Y4D2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30172858 0.90 ALDH1A1 (0.32) TSHR
SCHEMBL1132962 0.86 TSHR (0.41) TSHRFAAHCNR1DAGLA
SCHEMBL1132758 0.85 TSHR (0.40) TSHRFAAH
SCHEMBL7878009 0.85 TSHR (0.43) TSHRFAAHCNR1DAGLA
SCHEMBL7878019 0.85 TSHR (0.43) TSHRFAAHCNR1DAGLA
SCHEMBL7876250 0.85 TSHR (0.43) TSHRFAAHCNR1DAGLA
SCHEMBL6832092 0.85 TSHR (0.43) TSHRFAAHCNR1DAGLA
SCHEMBL28517612 0.84 TSHR (0.45) TSHRFAAH
SCHEMBL1132980 0.84 TSHR (0.42) TSHRFAAH
SCHEMBL28508981 0.84 TSHR (0.42) TSHRFAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114478912-B Photo-curing retention material and application thereof 上海新世纪齿科材料有限公司 2023-09-05 CN claimed
CN-114478912-A Light-cured retention material and application thereof 上海新世纪齿科材料有限公司 2022-05-13 CN claimed
CN-114478912-B Photo-curing retention material and application thereof 上海新世纪齿科材料有限公司 2023-09-05 CN disclosed
CN-115576174-A Toner and image forming apparatus 佳能株式会社 2023-01-06 CN disclosed
CN-114478912-A Light-cured retention material and application thereof 上海新世纪齿科材料有限公司 2022-05-13 CN disclosed