SCHEMBL2954728

SCHEMBL2954728

Cc1ccc(C(c2ccc(O)cc2)(c2ccc(O)cc2)c2ccc(O)cc2)c(-c2ccc(O)cc2)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 2/20 0.41
ACHE P22303 1/20 0.40
ESRRA P11474 1/20 0.39
MAPK1 P28482 1/20 0.37
MAP2K4 P45985 1/20 0.37
MAPKAPK2 P49137 1/20 0.37
MAPKAPK3 Q16644 1/20 0.37
MAPK6 Q16659 1/20 0.37
MAPKAPK5 Q8IW41 1/20 0.37
KIF11 P52732 2/20 0.37
ESR1 P03372 5/20 0.36
ESR2 Q92731 3/20 0.36
HSD17B10 Q99714 2/20 0.36
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
LMNA P02545 1/20 0.36
TYR P14679 1/20 0.36
CYP3A4 P08684 1/20 0.36
AR P10275 1/20 0.36
HPGD P15428 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28089573 0.82 MAOB (0.43) MAOBACHEESRRAMAPK1MAP2K4
SCHEMBL5953384 0.79 TP53 (0.48) ESR1ESR2CYP3A4AR
SCHEMBL6333099 0.76 CNR2 (0.43) ESR1ESR2HSD17B10NPC1RAB9A
SCHEMBL6333440 0.75 ESR2 (0.39) ESR1ESR2HSD17B10TSHR
SCHEMBL6336529 0.75 KDM4E (0.39) ESR1ESR2HSD17B10NPC1RAB9A
SCHEMBL6342106 0.75 RARB (0.42) ESR1ESR2HSD17B10LMNATYR
SCHEMBL6334648 0.75 ALOX15 (0.42) ESR1ESR2HSD17B10NPC1RAB9A
SCHEMBL29274246 0.74 ABL1 (0.48) KIF11ESR1ESR2HSD17B10LMNA
SCHEMBL14363399 0.74 BACE1 (0.51) MAOBACHEESRRAMAPK1MAP2K4
SCHEMBL29637921 0.74 ESRRA (0.61) MAOBACHEESRRAMAPK1MAP2K4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7220294-B2 Forming ambient pressure and temperature, lightweight, transportable power source; contacting gas with organic compound in pressurized state KURITA WATER INDUSTRIES LTD. (JP) 2007-05-22 US claimed
US-6222004-B1 MOLDABILITY IN BLOW MOLDING; APPEARANCE AND COLOR TONE IDEMITSU PETROCHEMICAL CO., LTD (JP) 2001-04-24 US claimed
WO-2024018957-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM 日産化学株式会社 2024-01-25 WO disclosed
US-20230103371-A1 PHOTORESIST UNDERLAYER COMPOSITION U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-04-06 US disclosed
US-7749625-B2 Fuel for fuel cell, fuel cell and application thereof KURITA WATER INDUSTRIES LTD. (JP) 2010-07-06 US disclosed
US-20080233438-A1 Fuel for fuel cell, fuel cell and application thereof KURITA WATER INDUSTRIES LTD. (JP) 2008-09-25 US disclosed
US-7122613-B1 Method for the production of polycarbonates GENERAL ELECTRIC COMPANY (US) 2006-10-17 US disclosed
US-20050228167-A1 Molecular compounds containing polymers having hydrogen bond sites as the constituent compounds NIPPON SODA CO., LTD. (JP) 2005-10-13 US disclosed
US-20040152022-A1 Resist remover composition DONGJIN SEMICHEM CO., LTD. (KR) 2004-08-05 US disclosed
WO-2002095500-A1 RESIST REMOVER COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2002-11-28 WO disclosed
EP-1035151-A4 BRANCHED POLYCARBONATE RESIN IDEMITSU PETROCHEMICAL CO (JP) 2001-09-05 EP disclosed
US-6222004-B1 MOLDABILITY IN BLOW MOLDING; APPEARANCE AND COLOR TONE IDEMITSU PETROCHEMICAL CO., LTD (JP) 2001-04-24 US disclosed