SCHEMBL2955545

SCHEMBL2955545

CO[Si](Cc1ccc(CCCl)cc1)(OC)OC

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 2/20 0.32
TSHR P16473 1/20 0.31
AKT1 P31749 1/20 0.30
ESR1 P03372 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2954750 0.88 CALM1 (0.35) TAAR1
SCHEMBL415828 0.84 ESR1 (0.39) TAAR1TSHRESR1SMN1; SMN2
SCHEMBL15444222 0.83 CA1 (0.34) ESR1
SCHEMBL2951509 0.80 AKT1 (0.32) TAAR1AKT1
SCHEMBL2952167 0.79 TDP1 (0.43) TAAR1TSHRESR1SMN1; SMN2
SCHEMBL938705 0.78 TAAR1 (0.43) TAAR1
SCHEMBL30791468 0.78 MAOB (0.38) TAAR1ESR1
SCHEMBL2954273 0.77 TAAR1 (0.33) TAAR1AKT1
SCHEMBL2953179 0.76 CALM1 (0.35) TAAR1
SCHEMBL988626 0.76 AGXT (0.43) TAAR1ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759406-B2 Process for producing polysilsesquioxane graft polymer, pressure-sensitive adhesive, and pressure-sensitive adhesive sheet LINTEC CORPORATION (JP) 2010-07-20 US disclosed
US-20080051487-A1 Process for Producing Polysilsesquioxane Graft Polymer, Pressure-Sensitive Adhesive, and Pressure-Sensitive Adhesive Sheet LINTEC CORPORATION (JP) 2008-02-28 US disclosed