SCHEMBL2956052

SCHEMBL2956052

CC(C)CO[Si](OCC(C)C)(C(C)C)C(C)C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15892165 0.80
SCHEMBL29079464 0.78
SCHEMBL2961111 0.75 ALDH1A1 (0.33) ALDH1A1
SCHEMBL29655582 0.75 ALDH1A1 (0.33) ALDH1A1
SCHEMBL428565 0.75 ALDH1A1 (0.33) ALDH1A1
SCHEMBL2957147 0.75
SCHEMBL200595 0.73 ALDH1A1 (0.36) ALDH1A1
SCHEMBL29655597 0.73 ALDH1A1 (0.32) ALDH1A1
SCHEMBL264609 0.71
SCHEMBL309252 0.71 ALDH1A1 (0.35) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112955514-B Composition for forming coating film, glass substrate coated with the composition, and touch panel using the glass substrate 阪田油墨株式会社 2022-09-06 CN disclosed
CN-112955514-A Composition for forming coating film, glass substrate coated with the composition, and touch panel using the glass substrate 阪田油墨株式会社 2021-06-11 CN disclosed
WO-2021065211-A1 COATING FILM-FORMING COMPOSITION, LAMINATE OBTAINED BY COATING SAID COATING FILM-FORMING COMPOSITION, TOUCH PANEL OBTAINED BY USING SAID LAMINATE, AND METHOD FOR FORMING CURED COATING FILM サカタインクス株式会社 2021-04-08 WO disclosed
CN-107367784-B Optical phase difference member and projector JXTG能源株式会社 2020-11-24 CN disclosed
CN-108139525-B Optical phase difference member and projector JXTG能源株式会社 2020-06-26 CN disclosed
US-10408984-B2 Optical phase difference component, composite optical component, incorporating optical phase difference component, and method for manufacturing optical phase difference component JX NIPPON OIL AND ENERGY CORPORATION (JP) 2019-09-10 US disclosed
US-9823392-B2 Optical substrate, mold to be used in optical substrate manufacture, and light emitting element including optical substrate JX NIPPON OIL & ENERGY CORPORATION (JP) 2017-11-21 US disclosed
US-20170199313-A1 OPTICAL PHASE DIFFERENCE COMPONENT, COMPOSITE OPTICAL COMPONENT, INCORPORATING OPTICAL PHASE DIFFERENCE COMPONENT, AND METHOD FOR MANUFACTURING OPTICAL PHASE DIFFERENCE COMPONENT JX NIPPON OIL & ENERGY CORPORATION (JP) 2017-07-13 US disclosed
EP-3178632-A1 METHOD FOR MANUFACTURING MEMBER HAVING IRREGULAR PATTERN JX Nippon Oil & Energy Corporation (JP) 2017-06-14 EP disclosed
US-9660217-B2 Light emitting element and method for maufacturing light emitting element JX NIPPON OIL & ENERGY CORPORATION (JP) 2017-05-23 US disclosed
US-20150060840-A1 ORGANIC EL ELEMENT AND METHOD FOR MANUFACTURING SAME JX NIPPON OIL & ENERGY CORPORATION (JP) 2015-03-05 US disclosed
US-20100283133-A1 FILM-FORMING COMPOSITION, INSULATING FILM WITH LOW DIELECTRIC CONSTANT, FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE HAMADA YOSHITAKA 2010-11-11 US disclosed
US-20100233482-A1 Organic silicon oxide fine particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device HAMADA YOSHITAKA 2010-09-16 US disclosed
US-7786022-B2 Method for forming insulating film with low dielectric constant SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-08-31 US disclosed
US-20100210765-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-08-19 US disclosed
US-7754330-B2 Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-07-13 US disclosed
US-20090294726-A1 ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-12-03 US disclosed
US-20090294922-A1 ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE PANASONIC CORPORATION (JP) 2009-12-03 US disclosed
US-20080290521-A1 FILM-FORMING COMPOSITION, INSULATING FILM WITH LOW DIELECTRIC CONSTANT, FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE SHIN ETSU CHEMICAL CO., LTD. 2008-11-27 US disclosed
US-20080292863-A1 SILOXANE POLYMER, PREPARATION METHOD THEREOF, POROUS-FILM FORMING COATING SOLUTION CONTAINING THE POLYMER, POROUS FILM, AND SEMICONDUCTOR DEVICE USING THE POROUS FILM SHIN ETSU CHEMICAL CO., LTD. 2008-11-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100210765-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION EXOC1, EPCAM, EXOC4 ALDH1A1 4787/4885
US-20090294922-A1 ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE SPOP, OSTC, SEM1 ALDH1A1 3005/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.