SCHEMBL29564735

SCHEMBL29564735

CCCC[O-].CCCC[O-].[Zr+4]

nearest known ligand 0.46

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.46
LMNA P02545 1/20 0.46
THRB P10828 1/20 0.43
CES1 P23141 6/20 0.37
CES2 O00748 5/20 0.37
ALDH1A1 P00352 3/20 0.35
TDP1 Q9NUW8 1/20 0.35
SLC22A1 O15245 2/20 0.33
SLC22A2 O15244 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
LSS P48449 1/20 0.32
CA1 P00915 1/20 0.32
DNM1 Q05193 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16105719 1.00 TSHR (0.46) TSHRLMNATHRBCES1CES2
SCHEMBL39696 1.00 TSHR (0.46) TSHRLMNATHRBCES1CES2
Hydrochloric Acid SCHEMBL31203513 0.96
Bromide SCHEMBL31203497 0.96
Bromide SCHEMBL31203648 0.96 TSHR (0.43) TSHRLMNATHRBCES1CES2
SCHEMBL1230738 0.96 TSHR (0.43) TSHRLMNATHRBCES1CES2
SCHEMBL1228632 0.96 TSHR (0.43) TSHRLMNATHRBCES1CES2
SCHEMBL1228584 0.96 TSHR (0.43) TSHRLMNATHRBCES1CES2
Hydrochloric Acid SCHEMBL31155773 0.96 TSHR (0.43) TSHRLMNATHRBCES1CES2
SCHEMBL8195406 0.96 TSHR (0.43) TSHRLMNATHRBCES1CES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12261037-B2 Tunability of dopant concentration in thin hafnium oxide films APPLIED MATERIALS, INC. (US) 2025-03-25 US claimed
US-12252452-B2 Coatings on particles of high energy materials and methods of forming same Forge Nano, Inc. (US) 2025-03-18 US claimed
US-12557212-B2 Electronic component MURATA MANUFACTURING CO., LTD. (JP) 2026-02-17 US disclosed
US-12476049-B2 Electronic component and method for manufacturing the same MURATA MANUFACTURING CO., LTD. (JP) 2025-11-18 US disclosed
US-20250331196-A1 MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2025-10-23 US disclosed
US-20250266189-A1 PROTECTIVE GLASS FILM MURATA MANUFACTURING CO., LTD. (JP) 2025-08-21 US disclosed
US-20250266570-A1 METHODS OF REACTIVE DRYING A SEPARATOR DURING BATTERY MANUFACTURING, DRIED SEPARATORS, AND BATTERIES CONTAINING THE SEPARATOR Forge Nano, Inc. 2025-08-21 US disclosed
US-12392034-B2 Method for producing organic-inorganic hybrid materials CIC NANOGUNE—ASOCIACIÓN CENTRO DE INVESTIGACIÓN COOPERATIVA EN NANOCIENCIAS (ES) 2025-08-19 US disclosed
US-20250250666-A1 LATERAL GAP FILL LAM RESEARCH CORPORATION 2025-08-07 US disclosed
US-12382640-B2 Memory device and method for fabricating the same TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2025-08-05 US disclosed
US-20250188002-A1 COATINGS ON PARTICLES OF HIGH ENERGY MATERIALS AND METHODS OF FORMING SAME Forge Nano Inc. 2025-06-12 US disclosed
US-20220333242-A1 Flow Control System for a Deposition Reactor Forge Nano Inc. 2022-10-20 US disclosed
WO-2022202038-A1 ELECTRONIC COMPONENT AND METHOD FOR PRODUCING SAME 株式会社村田製作所 2022-09-29 WO disclosed
WO-2022202039-A1 ELECTRONIC COMPONENT 株式会社村田製作所 2022-09-29 WO disclosed
US-20220231036-A1 MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2022-07-21 US disclosed
EP-4008695-A1 GLASS ARTICLES WITH MIXED POLYMER AND METAL OXIDE COATINGS Corning Incorporated (US) 2022-06-08 EP disclosed
US-20220152598-A1 PREPARATION OF MESOPOROUS SILICA SUPPORTED NiMoS CATALYSTS FOR HYDRODESULFURIZATION APPLICATION KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS (SA) 2022-05-19 US disclosed
WO-2022091731-A1 METAL COMPLEX, COMPOSITION, RESIST MATERIAL, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE DIC株式会社 2022-05-05 WO disclosed
US-20220139935-A1 MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2022-05-05 US disclosed
EP-3368491-B1 GLASS ARTICLES WITH MIXED POLYMER AND METAL OXIDE COATINGS CORNING INC (US) 2022-04-13 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12557212-B2 Electronic component CUTA, KCNK10, EMC2 TSHR 1621/4885LMNA 1816/4885THRB 2415/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.