SCHEMBL2958968

SCHEMBL2958968

C=C(C)C(=O)OC[SiH2]C=C(C)C

nearest known ligand 0.44

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.44
THRB P10828 1/20 0.41
ALDH1A1 P00352 2/20 0.39
POLB P06746 1/20 0.31
APEX1 P27695 1/20 0.31
HTT P42858 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL603534 0.80 ALDH1A1 (0.53) TSHRALDH1A1
SCHEMBL9332269 0.78 TSHR (0.51) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL14566180 0.74
SCHEMBL10897666 0.74
SCHEMBL17360817 0.74
SCHEMBL11583532 0.72 TSHR (0.48) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL5380761 0.72 TSHR (0.44) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL3898591 0.71 TSHR (0.47) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL2779557 0.69 TSHR (0.45) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL9065575 0.69 TSHR (0.45) TSHRTHRBALDH1A1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7749681-B2 Composition for forming lower layer film and pattern forming method JSR CORPORATION (JP) 2010-07-06 US disclosed
US-20090098486-A1 COMPOSITION FOR FORMING LOWER LAYER FILM AND PATTERN FORMING METHOD JSR CORPORATION (JP) 2009-04-16 US disclosed
EP-1995636-A1 COMPOSITION FOR FORMING LOWER LAYER FILM AND PATTERN FORMING METHOD JSR Corporation (JP) 2008-11-26 EP disclosed
US-6852791-B2 Anti-reflection coating forming composition JSR CORPORATION (JP) 2005-02-08 US disclosed
US-20020086934-A1 Anti-reflection coating forming composition JSR CORPORATION (JP) 2002-07-04 US disclosed
EP-1205805-A1 Anti-reflection coating forming composition JSR Corporation (JP) 2002-05-15 EP disclosed
US-6242161-B1 ABSORPTION COATINGS USING COPOLYMERS JSR CORPORATION (JP) 2001-06-05 US disclosed
EP-0683185-B1 (Meth)acrylate copolymer and elastomer compositions comprising said copolymer SUMITOMO CHEMICAL CO (JP) 1999-03-31 EP disclosed
US-5610226-A ELASTOMER OF COPOLYMER, CARBON BLACK AND A CROSSLINKING AGENT, AND RUBBER OBTAINED BY VULCANIZING ELASTOMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1997-03-11 US disclosed
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed
EP-0683185-A2 (Meth)acrylate copolymer and elastomer compositions comprising said copolymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1995-11-22 EP disclosed
EP-0367577-B1 Novel ester group-containing (meth) acrylic acid ester, novel (co)polymer thereof, composition comprising the (co) polymer and composition comprising the ester group- containing (meth) acrylic acid ester JAPAN SYNTHETIC RUBBER CO LTD (JP) 1994-01-05 EP disclosed
US-5026807-A Heat and cold resistance; oil repellents JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-06-25 US disclosed
EP-0367577-A1 Novel ester group-containing (meth) acrylic acid ester, novel (co)polymer thereof, composition comprising the (co) polymer and composition comprising the ester group- containing (meth) acrylic acid ester JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1990-05-09 EP disclosed