Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | CHRNB2 | P17787 | 5/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 5/20 | 0.41 |
| ▸ | CHRNB4 | P30926 | 5/20 | 0.41 |
| ▸ | CHRNA3 | P32297 | 5/20 | 0.41 |
| ▸ | CHRNA4 | P43681 | 5/20 | 0.41 |
| ▸ | SLC6A3 | Q01959 | 5/20 | 0.41 |
| ▸ | CHRNA1 | P02708 | 4/20 | 0.41 |
| ▸ | CHRNG | P07510 | 4/20 | 0.41 |
| ▸ | CHRNB1 | P11230 | 4/20 | 0.41 |
| ▸ | CHRND | Q07001 | 4/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28201107 | 0.98 | ALDH1A1 (0.43) | ALDH1A1MAPTNPSR1LMNAHPGD | |
| SCHEMBL4089646 | 0.98 | ALDH1A1 (0.43) | ALDH1A1MAPTNPSR1LMNAHPGD | |
| SCHEMBL3898658 | 0.94 | ALDH1A1 (0.43) | ALDH1A1MAPTNPSR1LMNAHPGD | |
| SCHEMBL6129180 | 0.90 | ALDH1A1 (0.46) | ALDH1A1MAPTNPSR1LMNAHPGD | |
| SCHEMBL6737298 | 0.82 | ALDH1A1 (0.43) | ALDH1A1MAPTNPSR1LMNAHPGD | |
| SCHEMBL20589054 | 0.82 | ALDH1A1 (0.43) | ALDH1A1MAPTNPSR1LMNAHPGD | |
| SCHEMBL2110264 | 0.81 | SIGMAR1 (0.42) | ALDH1A1MAPTNPSR1LMNAHPGD | |
| SCHEMBL3358932 | 0.81 | ALDH1A1 (0.40) | ALDH1A1MAPTNPSR1LMNAHPGD | |
| SCHEMBL27793003 | 0.81 | ALDH1A1 (0.41) | ALDH1A1MAPTNPSR1LMNAHPGD | |
| SCHEMBL16496970 | 0.81 | KDM4E (0.46) | ALDH1A1MAPTNPSR1LMNAHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104662004-B | Novel rebamipide prodrug, method for producing same, and usage thereof | 三进制药株式会社 | 2017-04-19 | — | — | CN | claimed |
| EP-0471592-B1 | Process for absorption of sulfur compounds from fluids using certain piperidines, piperazines, or anhydrides of monocarboxylic amino acids | DOW CHEMICAL CO (US) | 1995-08-09 | — | — | EP | claimed |
| US-5236678-A | Process for absorption of sulfur compounds from fluids using piperidines | THE DOW CHEMICAL COMPANY (US) | 1993-08-17 | — | — | US | claimed |
| EP-0552360-A1 | A COMPOSITION AND METHOD FOR SIMULTANEOUS ABSORPTION OF SULFUR DIOXIDE AND NITRIC OXIDE | THE DOW CHEMICAL COMPANY (US) | 1993-07-28 | — | — | EP | claimed |
| WO-1993003825-A1 | A COMPOSITION AND METHOD FOR SIMULTANEOUS ABSORPTION OF SULFUR DIOXIDE AND NITRIC OXIDE | THE DOW CHEMICAL COMPANY (US) | 1993-03-04 | — | — | WO | claimed |
| US-5167941-A | Sulfur dioxide; cationic polyelectrolyte stabilizers | THE DOW CHEMICAL COMPANY (US) | 1992-12-01 | — | — | US | claimed |
| EP-0471592-A2 | Process for absorption of sulfur compounds from fluids using certain piperidines, piperazines, or anhydrides of monocarboxylic amino acids | THE DOW CHEMICAL COMPANY (US) | 1992-02-19 | — | — | EP | claimed |
| CN-101477307-B | Photomask blank, resist pattern forming process, and photomask preparation process | SHIN ETSU EHEMICAL CO LTD | 2012-12-12 | — | — | CN | disclosed |
| CN-101625524-B | Photoresist composition and pattern forming method | SHINETSU CHEMICAL CO JP | 2012-11-28 | — | — | CN | disclosed |
| CN-102591152-A | Resist composition and patterning process | SHIN ETSU EHEMICAL CO LTD | 2012-07-18 | — | — | CN | disclosed |
| CN-102520581-A | Method for forming photoresist pattern | SHINETSU CHEMICAL CO | 2012-06-27 | — | — | CN | disclosed |
| US-7771913-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-7655378-B2 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-02-02 | — | — | US | disclosed |
| US-5622681-A | ION EXCHANGING HEAT STABLE SALT ANION WITH BASIC DIALYZING SOLUTION TO CONVERT TO HEAT REGENERABLE AMINE ABSORBENT; DONNAN EXCLUSION PRINCIPLES | THE DOW CHEMICAL COMPANY (US) | 1997-04-22 | — | — | US | disclosed |
| EP-0471592-B1 | Process for absorption of sulfur compounds from fluids using certain piperidines, piperazines, or anhydrides of monocarboxylic amino acids | DOW CHEMICAL CO (US) | 1995-08-09 | — | — | EP | disclosed |
| US-5236678-A | Process for absorption of sulfur compounds from fluids using piperidines | THE DOW CHEMICAL COMPANY (US) | 1993-08-17 | — | — | US | disclosed |
| EP-0552360-A1 | A COMPOSITION AND METHOD FOR SIMULTANEOUS ABSORPTION OF SULFUR DIOXIDE AND NITRIC OXIDE | THE DOW CHEMICAL COMPANY (US) | 1993-07-28 | — | — | EP | disclosed |
| WO-1993003825-A1 | A COMPOSITION AND METHOD FOR SIMULTANEOUS ABSORPTION OF SULFUR DIOXIDE AND NITRIC OXIDE | THE DOW CHEMICAL COMPANY (US) | 1993-03-04 | — | — | WO | disclosed |
| US-5167941-A | Sulfur dioxide; cationic polyelectrolyte stabilizers | THE DOW CHEMICAL COMPANY (US) | 1992-12-01 | — | — | US | disclosed |
| EP-0471592-A2 | Process for absorption of sulfur compounds from fluids using certain piperidines, piperazines, or anhydrides of monocarboxylic amino acids | THE DOW CHEMICAL COMPANY (US) | 1992-02-19 | — | — | EP | disclosed |