Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11913512 | 0.77 | TET2 (0.34) | MEN1KMT2AHTTNPSR1TET2 | |
| SCHEMBL28248918 | 0.76 | TET2 (0.31) | TET2HSD17B10TDP1 | |
| SCHEMBL11760396 | 0.76 | TET2 (0.31) | TET2HSD17B10TDP1 | |
| SCHEMBL13487230 | 0.74 | HSD17B10 (0.33) | HSD17B10TDP1 | |
| SCHEMBL7736489 | 0.73 | — | — | |
| SCHEMBL9430418 | 0.73 | — | — | |
| SCHEMBL13321339 | 0.72 | MEN1 (0.33) | MEN1KMT2AHTTNPSR1 | |
| SCHEMBL5605062 | 0.72 | KMT2A (0.41) | MEN1KMT2AHTTNPSR1TET2 | |
| SCHEMBL8395461 | 0.72 | MEN1 (0.31) | MEN1KMT2AHTTNPSR1 | |
| SCHEMBL21602932 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11785845-B2 | Composition | FUJIFILM CORPORATION (JP) | 2023-10-10 | — | — | US | disclosed |
| US-20220045283-A1 | COMPOSITION | FUJIFILM CORPORATION (JP) | 2022-02-10 | — | — | US | disclosed |
| US-8716535-B2 | Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-06 | — | — | US | disclosed |
| US-8716534-B2 | Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-06 | — | — | US | disclosed |
| US-8236901-B2 | Fluorinated compound, fluoropolymer and method for producing the compound | ASAHI GLASS COMPANY, LIMITED (JP) | 2012-08-07 | — | — | US | disclosed |
| US-8236901-B2 | Fluorinated compound, fluoropolymer and method for producing the compound | ASAHI GLASS COMPANY, LIMITED (JP) | 2012-08-07 | — | — | US | disclosed |
| EP-2064218-B1 | FLUORINATED ALKOXY-IMINO CATALYST COMPONENTS | TOTAL PETROCHEMICALS RES FELUY (BE) | 2011-04-20 | — | — | EP | disclosed |
| EP-2133369-B1 | NOVEL FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER, AND METHOD FOR PRODUCING THE COMPOUND | ASAHI GLASS CO LTD (JP) | 2011-04-13 | — | — | EP | disclosed |
| US-20100317808-A1 | NOVEL FLUORINATED COMPOUND, FLUOROPOLYMER AND METHOD FOR PRODUCING THE COMPOUND | ASAHI GLASS COMPANY, LIMITED (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100317808-A1 | NOVEL FLUORINATED COMPOUND, FLUOROPOLYMER AND METHOD FOR PRODUCING THE COMPOUND | ASAHI GLASS COMPANY, LIMITED (JP) | 2010-12-16 | — | — | US | disclosed |
| EP-1279069-A2 | POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-01-29 | — | — | EP | disclosed |
| US-6503686-B1 | Photoresists are comprised of a fluoroalcohol functional group and a nitrile-containing compound which together simultaneously mpart high ultraviolet (UV) transparency and developability in basic media | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-01-07 | — | — | US | disclosed |
| EP-1240554-A2 | NITRILE/FLUOROALCOHOL POLYMER-CONTAINING PHOTORESISTS AND ASSOCIATED PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-09-18 | — | — | EP | disclosed |
| WO-2001086352-A2 | POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-11-15 | — | — | WO | disclosed |
| WO-2001037047-A2 | NITRILE/FLUOROALCOHOL POLYMER-CONTAINING PHOTORESISTS AND ASSOCIATED PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-05-25 | — | — | WO | disclosed |
| US-4549921-A | PRETREATMENT WITH CORONA DISCHARGE, THEN APPLYING ADHESIVE MIXTUREOF VINYLIDENE FLUORIDE, HEXAFLUORO PROPYLENE, AND CURING AGENT | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-10-29 | — | — | US | disclosed |
| EP-0144147-A1 | Articles bonded with adhesive mixtures | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-06-12 | — | — | EP | disclosed |
| US-4510301-A | UPON HEAT SHRINKING IN LONGITUDINAL DIRECTION, DOES NOT EXPAND IN TRANSVERSE DIRECTION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-04-09 | — | — | US | disclosed |
| EP-0095942-A2 | Fluorocarbon copolymer films | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-12-07 | — | — | EP | disclosed |
| US-4267098-A | OPTIONALLY ALSO CONTAINING A COPOLYMERIZABLE MONOMER AND PHOSPHORUS ACID SALTS | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-05-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220045283-A1 | COMPOSITION | ADH1A, ADH1C, SLC19A2 | MEN1 740/4885KMT2A 1344/4885HTT 3598/4885 |
| US-11785845-B2 | Composition | ADH1A, ADH1C, SLC19A2 | MEN1 740/4885KMT2A 1344/4885HTT 3598/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.