SCHEMBL29634762

SCHEMBL29634762

C/C=C\C(=O)OCC(CO)(CO)COC(=O)/C=C\C

nearest known ligand 0.53

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.53
TP53 P04637 1/20 0.53
CYP3A4 P08684 1/20 0.53
MAPK1 P28482 1/20 0.53
SMN1; SMN2 Q16637 1/20 0.53
HIF1A Q16665 1/20 0.53
GSTP1 P09211 1/20 0.39
HCAR2 Q8TDS4 2/20 0.33
ATM Q13315 1/20 0.33
LMNA P02545 1/20 0.30
POLB P06746 1/20 0.30
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9329189 1.00 ALDH1A1 (0.53) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL5175932 0.96 ALDH1A1 (0.53) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL30849893 0.89 MAPK1 (0.43) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL29362627 0.83 THRB (0.44) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL22092321 0.83 MAPK1 (0.39) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL12462177 0.82 MAPK1 (0.53) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL6668000 0.82 MAPK1 (0.61) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL9066700 0.82 MAPK1 (0.61) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL27729710 0.82 ALDH1A1 (0.42) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
SCHEMBL9004563 0.78 GSTP1 (0.38) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119689782-A Polymerization inhibition system and photopolymerization type lithographic printing plate 乐凯华光印刷科技有限公司 2025-03-25 CN disclosed
EP-3392292-B1 METHOD FOR PRODUCING HETEROCYCLE-CONTAINING POLYMER PRECURSOR, HETEROCYCLE-CONTAINING POLYMER PRECURSOR, AND USE FOR SAME FUJIFILM CORP (JP) 2023-06-28 EP disclosed
CN-109313397-B Method for manufacturing laminate, method for manufacturing semiconductor element, and laminate 富士胶片株式会社 2023-04-11 CN disclosed
US-11597230-B2 Volume hologram sheet to be embedded, forgery prevention paper, and card DAI NIPPON PRINTING CO., LTD. (JP) 2023-03-07 US disclosed
EP-3162868-B1 THERMAL BASE GENERATOR, THERMOSETTING RESIN COMPOSITION, CURED FILM, CURED FILM MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2022-10-05 EP disclosed
CN-108700836-B Method for manufacturing laminate and method for manufacturing semiconductor device 富士胶片株式会社 2022-06-28 CN disclosed