Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.32 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetraethylene Glycol SCHEMBL23581563 | 1.00 | MEN1 (0.46) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL491642 | 0.89 | MEN1 (0.37) | MEN1KMT2ATSHRMAPK1THRB | |
| Tetraethylene Glycol SCHEMBL4886960 | 0.82 | MEN1 (0.55) | MEN1KMT2ATSHRMAPK1THRB | |
| Triethylene Glycol SCHEMBL1640973 | 0.82 | MEN1 (0.55) | MEN1KMT2ATSHRMAPK1THRB | |
| Pivalate SCHEMBL4885836 | 0.80 | TSHR (0.53) | MEN1KMT2ATSHRMAPK1THRB | |
| Pivalate SCHEMBL11109449 | 0.80 | TSHR (0.53) | MEN1KMT2ATSHRMAPK1THRB | |
| Triethylene Glycol SCHEMBL11010343 | 0.78 | MEN1 (0.50) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL15012611 | 0.77 | MEN1 (0.48) | MEN1KMT2ATSHRMAPK1THRB | |
| SCHEMBL158350 | 0.76 | ALDH1A1 (0.47) | TSHRMAPTALDH1A1 | |
| SCHEMBL57501 | 0.76 | ALDH1A1 (0.47) | TSHRMAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118234823-B | Resin composition for sealing material, sealing material using the resin composition, and solid polymer fuel cell and water electrolysis device using the sealing material | 凡纳克株式会社 | 2025-04-08 | — | — | CN | disclosed |
| CN-119126513-A | Image forming system with a plurality of image forming units | 柯尼卡美能达株式会社 | 2024-12-13 | — | — | CN | disclosed |
| CN-118234823-A | Resin composition for sealing material, sealing material using the resin composition, and solid polymer fuel cell and water electrolysis device using the sealing material | 凡纳克株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-117126638-A | Adhesive composition, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-11-28 | — | — | CN | disclosed |
| CN-116897399-A | Composition having magnetostriction properties and cured product thereof | 东京应化工业株式会社 | 2023-10-17 | — | — | CN | disclosed |
| CN-116589966-A | Adhesive composition, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116589965-A | Adhesive composition, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-115469508-A | Pattern forming method and method for producing curable composition | 东京应化工业株式会社 | 2022-12-13 | — | — | CN | disclosed |
| CN-115453832-A | Two-component developer for electrostatic image development, method for forming electrophotographic image, and electrophotographic image forming apparatus | 柯尼卡美能达株式会社 | 2022-12-09 | — | — | CN | disclosed |
| EP-4045544-A1 | SUPER ADVANCED CONTROLLED RADICAL POLYMERIZATION | BASF Coatings GmbH (DE) | 2022-08-24 | — | — | EP | disclosed |
| CN-114514256-A | Ultra high end controlled free radical polymerization | 巴斯夫涂料有限公司 | 2022-05-17 | — | — | CN | disclosed |