SCHEMBL2964608

SCHEMBL2964608

Cc1ccc([S+](c2ccc(C)cc2)c2ccc(C)cc2)cc1.O=S(=O)([O-])c1ccc(F)cc1F

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.36
KMT2A Q03164 2/20 0.36
MEN1 O00255 1/20 0.36
NFE2L2 Q16236 1/20 0.36
HTT P42858 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
PTGS2 P35354 2/20 0.36
AKR1B1 P15121 1/20 0.35
ACHE P22303 2/20 0.35
CCR2 P41597 1/20 0.35
ALDH1A1 P00352 1/20 0.35
RORC P51449 1/20 0.35
PTGS1 P23219 1/20 0.35
PAX8 Q06710 1/20 0.35
BCHE P06276 1/20 0.34
PIK3CA P42336 1/20 0.34
POLB P06746 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2954163 0.94 ALDH1A1 (0.36) MAPTKMT2AMEN1NFE2L2HTT
SCHEMBL3204756 0.85 ALDH1A1 (0.35) MAPTKMT2ASMN1; SMN2AKR1B1CCR2
SCHEMBL2537983 0.84 HTR2A (0.38) KMT2AMEN1AKR1B1CCR2ALDH1A1
SCHEMBL2954349 0.84 NPC1 (0.40) NFE2L2SMN1; SMN2ALDH1A1POLB
Toliodium SCHEMBL5403487 0.82 MAPT (0.38) MAPTKMT2AMEN1NFE2L2HTT
SCHEMBL2966029 0.81 POLB (0.39) KMT2AMEN1PTGS2ALDH1A1POLB
SCHEMBL3195789 0.81 GAA (0.37) MAPTKMT2AMEN1HTTSMN1; SMN2
SCHEMBL3200961 0.81 ALDH1A1 (0.35) MAPTKMT2AMEN1SMN1; SMN2ALDH1A1
SCHEMBL2964006 0.80 ACHE (0.48) KMT2AMEN1ACHEALDH1A1PAX8
SCHEMBL503949 0.80 ACHE (0.48) KMT2AMEN1ACHEALDH1A1PAX8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759045-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-07-20 US disclosed
US-20090004601-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-01 US disclosed
US-6893794-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-17 US disclosed
US-20040018445-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-01-29 US disclosed
US-20030068573-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-10 US disclosed