Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.50 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.45 |
| ▸ | LMNA | P02545 | 3/20 | 0.45 |
| ▸ | MAPT | P10636 | 3/20 | 0.45 |
| ▸ | MEN1 | O00255 | 3/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.45 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.45 |
| ▸ | PDK2 | Q15119 | 4/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | HPGD | P15428 | 2/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | APEX1 | P27695 | 2/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | GMNN | O75496 | 1/20 | 0.43 |
| ▸ | EGFR | P00533 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29482233 | 1.00 | ESR1 (0.50) | ESR1ESR2KDM4ELMNAMAPT | |
| SCHEMBL382439 | 1.00 | ESR1 (0.50) | ESR1ESR2KDM4ELMNAMAPT | |
| SCHEMBL8984563 | 0.88 | ALOX15 (0.46) | ESR1ESR2KDM4ELMNAMAPT | |
| SCHEMBL6756884 | 0.87 | ESR1 (0.49) | ESR1ESR2KDM4ELMNAMAPT | |
| SCHEMBL8930207 | 0.87 | MCL1 (0.48) | ESR1ESR2KDM4ELMNAMAPT | |
| SCHEMBL4792150 | 0.84 | ALDH1A1 (0.46) | ESR1ESR2KDM4ELMNAMAPT | |
| SCHEMBL29616923 | 0.84 | ALDH1A1 (0.46) | ESR1ESR2KDM4ELMNAMAPT | |
| SCHEMBL29355276 | 0.84 | KMT2A (0.56) | ESR1ESR2KDM4ELMNAMAPT | |
| SCHEMBL44942 | 0.84 | KMT2A (0.56) | ESR1ESR2KDM4ELMNAMAPT | |
| SCHEMBL172184 | 0.83 | S100A4 (0.50) | ESR1ESR2KDM4ELMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115113482-A | Negative photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film | 信越化学工业株式会社 | 2022-09-27 | — | — | CN | disclosed |
| CN-109960111-B | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and method for forming pattern | 信越化学工业株式会社 | 2022-07-12 | — | — | CN | disclosed |
| CN-114690555-A | Organic film forming material, pattern forming method and polymer | 信越化学工业株式会社 | 2022-07-01 | — | — | CN | disclosed |
| CN-114675490-A | Organic film forming material, pattern forming method, compound and polymer | 信越化学工业株式会社 | 2022-06-28 | — | — | CN | disclosed |
| CN-108693713-B | Resist underlayer film material, pattern formation method, and resist underlayer film formation method | 信越化学工业株式会社 | 2022-06-03 | — | — | CN | disclosed |