Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.54 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.51 |
| ▸ | LMNA | P02545 | 2/20 | 0.51 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.51 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.51 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.51 |
| ▸ | TSHR | P16473 | 1/20 | 0.51 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.51 |
| ▸ | HTT | P42858 | 1/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | HTR2A | P28223 | 2/20 | 0.46 |
| ▸ | CNR2 | P34972 | 1/20 | 0.45 |
| ▸ | CA12 | O43570 | 1/20 | 0.45 |
| ▸ | CA1 | P00915 | 1/20 | 0.45 |
| ▸ | CA9 | Q16790 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | ESR1 | P03372 | 2/20 | 0.44 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.44 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.44 |
| ▸ | TACR2 | P21452 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2955495 | 1.00 | CA2 (0.54) | CA2KCNH2LMNAHIF1ACYP2D6 | |
| SCHEMBL2960150 | 0.94 | CA2 (0.54) | CA2KCNH2LMNAHIF1ACYP2D6 | |
| SCHEMBL2966132 | 0.93 | KCNH2 (0.58) | CA2KCNH2LMNAHIF1ACYP2D6 | |
| SCHEMBL2967119 | 0.93 | KCNH2 (0.58) | CA2KCNH2LMNAHIF1ACYP2D6 | |
| SCHEMBL2964238 | 0.90 | ALOX15B (0.46) | CA2KCNH2LMNAHIF1ACYP2D6 | |
| SCHEMBL2960491 | 0.90 | ALOX15B (0.46) | CA2KCNH2LMNAHIF1ACYP2D6 | |
| SCHEMBL2963870 | 0.87 | CNR2 (0.57) | CA2KCNH2LMNAHIF1ACYP2D6 | |
| SCHEMBL2956226 | 0.87 | LMNA (0.62) | CA2KCNH2LMNAHIF1ACYP2D6 | |
| SCHEMBL2957248 | 0.87 | LMNA (0.62) | CA2KCNH2LMNAHIF1ACYP2D6 | |
| SCHEMBL28417025 | 0.86 | CA2 (0.54) | CA2KCNH2LMNAHIF1ACYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7759045-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-07-20 | — | — | US | disclosed |
| US-20090004601-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-01-01 | — | — | US | disclosed |
| US-7214467-B2 | Photosensitive resin composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7198880-B2 | Positive resist composition | FUJIFILM CORPORATION (JP) | 2007-04-03 | — | — | US | disclosed |
| US-7163776-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-16 | — | — | US | disclosed |
| US-7160666-B2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-09 | — | — | US | disclosed |
| US-6893794-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-05-17 | — | — | US | disclosed |
| EP-1480079-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-24 | — | — | EP | disclosed |
| US-6811947-B2 | RESIN, WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-02 | — | — | US | disclosed |
| US-20040018445-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-01-29 | — | — | US | disclosed |
| US-20040009430-A1 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. | 2004-01-15 | — | — | US | disclosed |
| EP-1376232-A1 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030232277-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-12-18 | — | — | US | disclosed |
| US-20030219679-A1 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. | 2003-11-27 | — | — | US | disclosed |
| US-20030203308-A1 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. | 2003-10-30 | — | — | US | disclosed |
| US-20030194641-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-10-16 | — | — | US | disclosed |
| US-20030068573-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-10 | — | — | US | disclosed |