Known targets — ChEMBL curated mechanism
CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 4/20 | 0.47 |
| ▸ | CA9 | Q16790 | 4/20 | 0.47 |
| ▸ | CA1 | P00915 | 3/20 | 0.47 |
| ▸ | CA2 | P00918 | 3/20 | 0.47 |
| ▸ | GAA | P10253 | 4/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | GFER | P55789 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7133269 | 1.00 | CA12 (0.47) | CA12CA9CA1CA2GAA | |
| SCHEMBL3144525 | 0.98 | CA12 (0.46) | CA12CA9CA1CA2GAA | |
| P-Xylene SCHEMBL3404430 | 0.98 | GAA (0.46) | CA12CA9CA1CA2GAA | |
| SCHEMBL2964104 | 0.98 | CA12 (0.46) | CA12CA9CA1CA2GAA | |
| SCHEMBL2962482 | 0.96 | GAA (0.45) | CA12CA9CA1CA2GAA | |
| SCHEMBL2955936 | 0.94 | GAA (0.46) | CA12CA9CA1CA2GAA | |
| SCHEMBL3135344 | 0.90 | LMNA (0.43) | CA12CA9CA1CA2GAA | |
| SCHEMBL3135080 | 0.90 | ACHE (0.42) | CA12CA9CA1CA2GAA | |
| SCHEMBL547499 | 0.90 | ACHE (0.42) | CA12CA9CA1CA2GAA | |
| SCHEMBL3136301 | 0.90 | LMNA (0.43) | CA12CA9CA1CA2GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3258 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119668028-A | Negative photoresist composition, application thereof and imaging method | 福建泓光半导体材料有限公司 | 2025-03-21 | — | — | CN | claimed |
| CN-119487452-A | Enhanced EUV photoresist and method of use thereof | 亚历克斯·P·G·罗宾逊 | 2025-02-18 | — | — | CN | claimed |
| US-20240294771-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | Tan Kah Kee Innovation Laboratory (CN) | 2024-09-05 | — | — | US | claimed |
| CN-118295209-A | Photoresist composition containing two sulfonium salts and preparation method and application thereof | 中国科学院化学研究所 | 2024-07-05 | — | — | CN | claimed |
| CN-118244576-A | Photosensitive resin composition and cured film thereof | 罗门哈斯电子材料韩国有限公司 | 2024-06-25 | — | — | CN | claimed |
| CN-117452768-A | Composition for immersion photoresist top coating | 徐州博康信息化学品有限公司 | 2024-01-26 | — | — | CN | claimed |
| WO-2023070957-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | 嘉庚创新实验室 | 2023-05-04 | — | — | WO | claimed |
| CN-113913075-B | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-09-20 | — | — | CN | claimed |
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| CN-113913075-A | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-01-11 | — | — | CN | claimed |
| US-6436606-B1 | POLYMERS AND PHOTORESISTS COATING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-20 | — | — | US | claimed |
| EP-0827970-B1 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT FINANCE BVI LTD (VG) | 2001-09-26 | — | — | EP | claimed |
| US-20010009749-A1 | Chemically amplified resist | NEC CORPORATION | 2001-07-26 | — | — | US | claimed |
| WO-2001029837-A1 | MEDIUM FOR FLUORESCENT READ-ONLY MULTILAYER OPTICAL INFORMATION CARRIER AND ITS MANUFACTURING METHOD | TRID STORE IP, LLC (US) | 2001-04-26 | — | — | WO | claimed |
| US-6096478-A | Resist material for forming a chemically amplified negative type resist pattern and method of manufacturing a semiconductor device employing the resist pattern | NEC CORPORATION (JP) | 2000-08-01 | — | — | US | claimed |
| CN-1227355-A | Photoresist material and method for producing semiconductor constituted of corrosion resist picture thereof | NEC CORP (JP) | 1999-09-01 | — | — | CN | claimed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | claimed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | claimed |
| US-5629134-A | SOLVENT, ALKALI SOLUBLE RESIN, ACID GENERATOR, PYRIDINE SALT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-05-13 | — | — | US | claimed |
| US-4108747-A | Curable compositions and method for curing such compositions | GENERAL ELECTRIC COMPANY (US) | 1978-08-22 | — | — | US | claimed |