Known targets — ChEMBL curated mechanism
CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 4/20 | 0.46 |
| ▸ | CA9 | Q16790 | 4/20 | 0.46 |
| ▸ | CA1 | P00915 | 3/20 | 0.46 |
| ▸ | CA2 | P00918 | 3/20 | 0.46 |
| ▸ | GAA | P10253 | 4/20 | 0.45 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | GFER | P55789 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3144525 | 1.00 | CA12 (0.46) | CA12CA9CA1CA2GAA | |
| SCHEMBL2962482 | 0.98 | GAA (0.45) | CA12CA9CA1CA2GAA | |
| SCHEMBL64189 | 0.98 | CA12 (0.47) | CA12CA9CA1CA2GAA | |
| SCHEMBL7133269 | 0.98 | CA12 (0.47) | CA12CA9CA1CA2GAA | |
| SCHEMBL2955936 | 0.96 | GAA (0.46) | CA12CA9CA1CA2GAA | |
| P-Xylene SCHEMBL3404430 | 0.96 | GAA (0.46) | CA12CA9CA1CA2GAA | |
| SCHEMBL2966006 | 0.92 | GAA (0.52) | CA12CA9CA1CA2GAA | |
| SCHEMBL3135080 | 0.92 | ACHE (0.42) | CA12CA9CA1CA2GAA | |
| SCHEMBL3136301 | 0.92 | LMNA (0.43) | CA12CA9CA1CA2GAA | |
| SCHEMBL547499 | 0.92 | ACHE (0.42) | CA12CA9CA1CA2GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0955563-B1 | A photoresist composition | SUMITOMO CHEMICAL CO (JP) | 2003-03-19 | — | — | EP | claimed |
| US-6153349-A | COMPRISING POLYVINYLPHENOL DERIVATIVE RESIN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-11-28 | — | — | US | claimed |
| EP-0955563-A1 | A photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-11-10 | — | — | EP | claimed |
| EP-1676835-B1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | WAKO PURE CHEM IND LTD (JP) | 2014-12-10 | — | — | EP | disclosed |
| US-8206888-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-7759045-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-07-20 | — | — | US | disclosed |
| EP-1720063-B1 | Resin containing ketene-aldehyde copolymer | NIPPON SODA CO (JP) | 2010-04-07 | — | — | EP | disclosed |
| US-20100028800-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| US-7642368-B2 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| EP-1449833-B1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2009-09-09 | — | — | EP | disclosed |
| US-7576223-B2 | Polymer of a (meth)acryloyloxy)ethoxycarbonyl)sulfonium sulfonate, e.g., 1-[2-(2-methylacryloyloxy)ethoxycarbonyl]tetrahydrothiophenium perfluorobutanesulfonate; used a an acid generator in excimer laser lithography; stable fine patterns without collapse and improved line edge roughness. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-18 | — | — | US | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| US-20020015913-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-07 | — | — | US | disclosed |
| US-20020012874-A1 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1167349-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-02 | — | — | EP | disclosed |
| US-6280902-B1 | RESIN CONVERTED TO ALKALI SOLUBLE TO ALKALI INSOLUBLE OR ALKALI SLIGHTLY ACID SOLUBLE, AN ACID GENERATOR AND NITROGEN CYCLIC COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1113005-A1 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2001-07-04 | — | — | EP | disclosed |
| EP-1058153-A1 | Positive working photoresist compositions | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-12-06 | — | — | EP | disclosed |
| US-6153349-A | COMPRISING POLYVINYLPHENOL DERIVATIVE RESIN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-11-28 | — | — | US | disclosed |
| EP-0955563-A1 | A photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-11-10 | — | — | EP | disclosed |