Fumaric Acid

Fumaric Acid

SCHEMBL29660279

C1CN=C2CCCN2C1.O=C(O)/C=C/C(=O)O

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRB1ADRB2ATP4AATP4BAXLCHRM2CHRM3DRD2FLT3HRH1HTR2AHTR2BHTR2CKCNH2KMT2AMAP2K1MAP2K2MEN1MLNRPLK4RENS1PR1SLC6A2SLC6A4atpAatpBatpCatpDatpEatpFatpFHatpGpol

The experimentally established mechanism targets of Fumaric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
INMT O95050 7/20 1.00
USP2 O75604 1/20 0.58
BLM P54132 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fumaric Acid SCHEMBL29660234 0.93 INMT (0.97) INMTUSP2
Bicarbonate SCHEMBL31253382 0.91 INMT (0.82) INMTUSP2
Bicarbonate SCHEMBL6183133 0.85 INMT (0.83) INMTUSP2
Acetic Acid SCHEMBL2694265 0.85 INMT (0.74) INMTUSP2
Acetic Acid SCHEMBL23577659 0.84 INMT (0.72) INMTUSP2
Bicarbonate SCHEMBL6363121 0.83 INMT (0.84) INMTUSP2
SCHEMBL2927 0.82
Succinic Acid SCHEMBL38652190 0.82 INMT (0.70) INMTUSP2
Bicarbonate SCHEMBL6184428 0.81 INMT (0.81) INMTUSP2
SCHEMBL10644910 0.81 INMT (0.68) INMTUSP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114207043-B Composition for producing siliceous film having low dielectric constant and method for producing cured film and electronic device using the same 默克专利有限公司 2023-09-15 CN claimed
EP-4010441-B1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2023-09-06 EP claimed
US-11512171-B2 Low dielectric constant siliceous film manufacturing composition and methods for producing cured film and electronic device using the same MERCK PATENT GMBH (DE) 2022-11-29 US claimed
US-20220267532-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2022-08-25 US claimed
EP-4010441-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME Merck Patent GmbH (DE) 2022-06-15 EP claimed
EP-4010441-B1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2023-09-06 EP disclosed
US-11512171-B2 Low dielectric constant siliceous film manufacturing composition and methods for producing cured film and electronic device using the same MERCK PATENT GMBH (DE) 2022-11-29 US disclosed
US-20220267532-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2022-08-25 US disclosed
EP-4010441-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME Merck Patent GmbH (DE) 2022-06-15 EP disclosed