Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARL | Q9H300 | 4/20 | 0.46 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL66132 | 0.83 | PARL (0.43) | PARLCA12CA1CA2CA9 | |
| SCHEMBL64833 | 0.80 | PARL (0.47) | PARLCA12CA1CA2CA9 | |
| SCHEMBL12907387 | 0.78 | PARL (0.46) | PARLCA12CA1CA2CA9 | |
| SCHEMBL65689 | 0.75 | PARL (0.43) | PARL | |
| SCHEMBL28411329 | 0.74 | PARL (0.54) | PARLCA12CA1CA2CA9 | |
| SCHEMBL5213568 | 0.74 | PARL (0.42) | PARL | |
| SCHEMBL2677308 | 0.72 | PARL (0.41) | PARLHPGDSMN1; SMN2ALOX12 | |
| SCHEMBL64006 | 0.71 | PRKCA (0.40) | PARLSMN1; SMN2 | |
| SCHEMBL8643347 | 0.71 | PARL (0.40) | PARLCA12CA1CA2CA9 | |
| SCHEMBL15019558 | 0.71 | PARL (0.40) | PARL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6569596-B1 | Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-05-27 | — | — | US | claimed |
| US-7759045-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-07-20 | — | — | US | disclosed |
| US-20090004601-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-01-01 | — | — | US | disclosed |
| CN-101334588-A | Chemically amplified positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2008-12-31 | — | — | CN | disclosed |
| US-6893794-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-05-17 | — | — | US | disclosed |
| US-20040018445-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-01-29 | — | — | US | disclosed |
| US-6569596-B1 | Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-05-27 | — | — | US | disclosed |
| US-20030068573-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-10 | — | — | US | disclosed |
| US-6156476-A | Positive photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-12-05 | — | — | US | disclosed |
| EP-0607899-B1 | Positive photoresist composition | SUMITOMO CHEMICAL CO (JP) | 2000-06-14 | — | — | EP | disclosed |
| US-6068962-A | NOVOLAK RESIN AS AN ALKALI-SOLUBLE COMPONENT; QUINONEDIAZIDE; ACID GENERATOR; ANTHRACENE DERIVATIVE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-05-30 | — | — | US | disclosed |
| EP-0831371-A2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-03-25 | — | — | EP | disclosed |
| EP-0607899-A2 | Positive photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-07-27 | — | — | EP | disclosed |