Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARL | Q9H300 | 4/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | CA1 | P00915 | 3/20 | 0.32 |
| ▸ | CA2 | P00918 | 3/20 | 0.32 |
| ▸ | CA9 | Q16790 | 3/20 | 0.32 |
| ▸ | CA12 | O43570 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | F2 | P00734 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | VDR | P11473 | 1/20 | 0.31 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | CA4 | P22748 | 1/20 | 0.30 |
| ▸ | FAAH | O00519 | 1/20 | 0.30 |
| ▸ | MGLL | Q99685 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL65689 | 0.85 | PARL (0.43) | PARLLMNAMAPTGAAFAAH | |
| SCHEMBL2677308 | 0.82 | PARL (0.41) | PARLLMNAALDH1A1MAPTALOX12 | |
| SCHEMBL64006 | 0.81 | PRKCA (0.40) | PARLSMN1; SMN2FAAHMGLL | |
| SCHEMBL2966472 | 0.80 | PARL (0.46) | PARLCA1CA2CA9CA12 | |
| SCHEMBL12907387 | 0.80 | PARL (0.46) | PARLCA1CA2CA9CA12 | |
| SCHEMBL64128 | 0.79 | PRKCA (0.43) | PARLCA2SMN1; SMN2FAAHMGLL | |
| SCHEMBL2955306 | 0.79 | PRKCA (0.43) | PARLCA2SMN1; SMN2FAAHMGLL | |
| SCHEMBL7716556 | 0.79 | PRKCA (0.43) | PARLCA2SMN1; SMN2FAAHMGLL | |
| SCHEMBL66132 | 0.77 | PARL (0.43) | PARLCA1CA2CA9CA12 | |
| SCHEMBL8643347 | 0.77 | PARL (0.40) | PARLLMNACA1CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 523 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8722321-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-13 | — | — | US | claimed |
| US-20120276485-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-01 | — | — | US | claimed |
| US-20120270159-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-25 | — | — | US | claimed |
| US-7794915-B2 | Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method | MITSUI CHEMICALS, INC. (JP) | 2010-09-14 | — | — | US | claimed |
| EP-1538173-B1 | Hydrogenated ring-opening metathesis polymer and process for producing the same | MITSUI CHEMICALS INC (JP) | 2009-11-04 | — | — | EP | claimed |
| EP-1275676-B1 | HYDROGENATED RING-OPENING METATHESIS COPOLYMER AND PROCESS FOR PRODUCING THE SAME | MITSUI CHEMICALS INC (JP) | 2008-05-07 | — | — | EP | claimed |
| US-20080085470-A1 | Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method | MITSUI CHEMICALS, INC. (JP) | 2008-04-10 | — | — | US | claimed |
| US-7081501-B2 | Hydrogenated ring-opening metathesis polymer and process for producing the same | MITSUI CHEMICALS, INC. (JP) | 2006-07-25 | — | — | US | claimed |
| EP-1538173-A1 | Hydrogenated ring-opening metathesis polymer and process for producing the same | Mitsui Chemicals, Inc. (JP) | 2005-06-08 | — | — | EP | claimed |
| US-20050119412-A1 | Hydrogenated ring-opening metathesis polymer and process for producing the same | MITSUI CHEMICALS, INC. (JP) | 2005-06-02 | — | — | US | claimed |
| US-6878508-B2 | Resist patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-12 | — | — | US | claimed |
| US-6800720-B2 | BASE POLYMER CONTAINING AN ESTER GROUP TO BE DECOMPOSED TO A CARBOXYLIC ACID TO BECOME SOLUBLE IN THE DEVELOPER FOR A PHOTORESIST USED IN FINE WORKING OF A SEMICONDUCTOR USING ULTRAVIOLET RAY; HEAT RESISTANCE; OPTICS; ADHESION | MITSUI CHEMICALS, INC. (JP) | 2004-10-05 | — | — | US | claimed |
| US-6605408-B2 | Hydrogenated polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-08-12 | — | — | US | claimed |
| US-20030108819-A1 | Resist patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-06-12 | — | — | US | claimed |
| US-6569596-B1 | Photoresists comprising N-(ethylsulfonyloxy)succinimide, novolaks, curing agents and an acid generators such as alpha -(hexylsulfonyloxyimino)-4-methoxybenzyl cyanide; integrated circuits; semiconductors | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-05-27 | — | — | US | claimed |
| EP-1275676-A1 | HYDROGENATED RING-OPENING METATHESIS COPOLYMER AND PROCESS FOR PRODUCING THE SAME | Mitsui Chemicals, Inc. (JP) | 2003-01-15 | — | — | EP | claimed |
| EP-1276012-A2 | Resist patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-15 | — | — | EP | claimed |
| US-20020165328-A1 | Hydrogenated ring-opening metathesis copolymer and process for producing the same | MITSUI CHEMICALS, INC. (JP) | 2002-11-07 | — | — | US | claimed |
| US-20020001772-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-03 | — | — | US | claimed |
| US-5916728-A | RESIN WHICH IS CONVERTED TO ALKALI-SOLUBLE FROM ALKALI-INSOLUBLE OR ALKALI-SLIGHTLY SOLUBLE BY THE ACTION OF AN ACID, ACID GENERATOR AND TERTIARY AMINE COMPOUND HAVING AN ALIPHATIC HYDROXYL GROUP. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-06-29 | — | — | US | claimed |