SCHEMBL29693584

SCHEMBL29693584

Nc1nc(O)nc(O)c1N=O

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CDK2 P24941 5/20 0.41
CDK1 P06493 4/20 0.41
CDK4 P11802 1/20 0.41
CCNA2 P20248 4/20 0.38
CCNA1 P78396 4/20 0.38
KMT2A Q03164 3/20 0.33
CCNB1 P14635 3/20 0.33
MEN1 O00255 2/20 0.33
CCNB2 O95067 1/20 0.33
MTOR P42345 1/20 0.33
ATR Q13535 1/20 0.33
CCNB3 Q8WWL7 1/20 0.33
MAPT P10636 2/20 0.33
KDM4E B2RXH2 1/20 0.33
CASP6 P55212 1/20 0.33
MGMT P16455 2/20 0.31
POLB P06746 1/20 0.30
ATM Q13315 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2745214 1.00 CDK2 (0.41) CDK2CDK1CDK4CCNA2CCNA1
SCHEMBL7766477 0.88 CDK2 (0.45) CDK2CDK1CDK4CCNA2CCNA1
SCHEMBL9443860 0.84 CDK2 (0.32) CDK2CDK1CDK4CCNA2CCNA1
SCHEMBL11073630 0.83 HSP90AA1 (0.31)
SCHEMBL4160357 0.82 CDK2 (0.52) CDK2CDK1CDK4CCNA2CCNA1
SCHEMBL29473573 0.82 CDK2 (0.52) CDK2CDK1CDK4CCNA2CCNA1
SCHEMBL6402248 0.78 CDK2 (0.40) CDK2CDK1CDK4CCNA2CCNA1
SCHEMBL5026853 0.78 CDK2 (0.38) CDK2CDK1CDK4CCNA2CCNA1
Nitrous Acid SCHEMBL29168822 0.78 CDK2 (0.48) CDK2CDK1CDK4CCNA2CCNA1
SCHEMBL10441417 0.78 CDK2 (0.38) CDK2CDK1CDK4CCNA2CCNA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121779474-A Synthesis method of furodiazole [3,4-d ] fluorouridine and thiadiazole [3,4-d ] fluorouridine 江南大学 2026-04-03 CN disclosed
CN-112004845-B Resin composition, laminate, semiconductor wafer with resin composition layer, substrate, and semiconductor device 三菱瓦斯化学株式会社 2022-05-31 CN disclosed