Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.65 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.65 |
| ▸ | DHFR | P00374 | 2/20 | 0.49 |
| ▸ | MEN1 | O00255 | 4/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.47 |
| ▸ | LMNA | P02545 | 3/20 | 0.47 |
| ▸ | MAPT | P10636 | 3/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | XBP1 | P17861 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | JAK2 | O60674 | 1/20 | 0.38 |
| ▸ | PDK2 | Q15119 | 7/20 | 0.38 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.36 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.36 |
| ▸ | ACMSD | Q8TDX5 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL217779 | 1.00 | ESR1 (0.65) | ESR1ESR2DHFRMEN1KMT2A | |
| SCHEMBL172120 | 0.88 | ESR1 (0.51) | ESR1ESR2DHFRMEN1KMT2A | |
| SCHEMBL1324119 | 0.83 | ESR1 (0.71) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL29375514 | 0.83 | ESR1 (0.71) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL7917312 | 0.81 | ESR1 (0.50) | ESR1ESR2DHFRMEN1KMT2A | |
| SCHEMBL2405956 | 0.79 | MEN1 (0.56) | ESR1ESR2DHFRMEN1KMT2A | |
| SCHEMBL70957 | 0.79 | ESR1 (1.00) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL2837044 | 0.79 | ESR2 (0.65) | ESR1ESR2DHFRMEN1KMT2A | |
| SCHEMBL2832176 | 0.79 | ESR1 (0.65) | ESR1ESR2DHFRMEN1KMT2A | |
| SCHEMBL17722590 | 0.79 | ESR1 (0.60) | ESR1ESR2MEN1KMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250372377-A1 | METAL-CONTAINING FILM PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-04 | — | — | US | disclosed |
| US-12379663-B2 | Material for forming organic film, patterning process, and polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-08-05 | — | — | US | disclosed |
| CN-120192340-A | Metal-containing film forming compound, metal-containing film forming composition, and pattern forming method | 信越化学工业株式会社 | 2025-06-24 | — | — | CN | disclosed |
| CN-120192535-A | Metal-containing film forming compound, metal-containing film forming composition, and pattern forming method | 信越化学工业株式会社 | 2025-06-24 | — | — | CN | disclosed |
| CN-116694114-B | Composition for forming metal oxide film, pattern forming method, and metal oxide film forming method | 信越化学工业株式会社 | 2025-06-13 | — | — | CN | disclosed |
| CN-113050373-B | Organic film forming material, organic film forming method, pattern forming method, and compound | 信越化学工业株式会社 | 2025-05-16 | — | — | CN | disclosed |
| CN-119902413-A | Photosensitive coloring resin composition, color filter, manufacturing method thereof and liquid crystal display device | 奇美实业股份有限公司 | 2025-04-29 | — | — | CN | disclosed |
| CN-111748077-B | Alkali-soluble resin, hydrogenated compound, method for producing same, resin composition, cured film thereof, touch panel, and optical filter | 日铁化学材料株式会社 | 2025-04-18 | — | — | CN | disclosed |
| CN-119493337-A | Method for forming resist underlayer film and method for forming pattern | 信越化学工业株式会社 | 2025-02-21 | — | — | CN | disclosed |
| CN-113359390-B | Composition for forming coated organic film, pattern forming method, polymer, and method for producing polymer | 信越化学工业株式会社 | 2025-01-24 | — | — | CN | disclosed |
| CN-116360215-A | Photosensitive resin composition for black resist, process for producing the same, light shielding film, color filter, touch panel, and display device | 日铁化学材料株式会社 | 2023-06-30 | — | — | CN | disclosed |
| CN-116360214-A | Photosensitive resin composition, cured film, substrate with cured film, method for producing substrate with cured film, and display device | 日铁化学材料株式会社 | 2023-06-30 | — | — | CN | disclosed |
| EP-4020082-B1 | MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, COMPOUND, AND POLYMER | SHINETSU CHEMICAL CO (JP) | 2023-04-26 | — | — | EP | disclosed |
| CN-115903385-A | Photosensitive resin composition, cured film, color filter, touch panel, and display device | 日铁化学材料株式会社 | 2023-04-04 | — | — | CN | disclosed |
| CN-109388024-B | Photosensitive resin composition and method for producing the same, black matrix, pixel layer, protective film, color filter, and liquid crystal display device | 奇美实业股份有限公司 | 2023-02-28 | — | — | CN | disclosed |
| CN-115704928-A | Cured film for information display device, composition for transparent cured film, and information display device | 日铁化学材料株式会社 | 2023-02-17 | — | — | CN | disclosed |
| CN-115145114-A | Photosensitive resin composition for light-shielding film, and light-shielding film, color filter and display device using same | 日铁化学材料株式会社 | 2022-10-04 | — | — | CN | disclosed |
| CN-115145118-A | Photosensitive resin composition for black resist, light-shielding film, and method for producing light-shielding film for color filter | 日铁化学材料株式会社 | 2022-10-04 | — | — | CN | disclosed |
| CN-109960111-B | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and method for forming pattern | 信越化学工业株式会社 | 2022-07-12 | — | — | CN | disclosed |
| CN-108693713-B | Resist underlayer film material, pattern formation method, and resist underlayer film formation method | 信越化学工业株式会社 | 2022-06-03 | — | — | CN | disclosed |